Journal of Synthetic Crystals, Volume. 54, Issue 6, 942(2025)

Effect of Cable Diameter on Growth Stability of Large-Size Czochralski Silicon Crystals

Litao ZHU, Lei LIU, Shuai YUAN*, Shenglang ZHOU, Huali ZHANG, Chen WANG, Yu GAO, Jianwei CAO, Xuegong YU, and Deren YANG*
Author Affiliations
  • State Key Lab of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou310027, China
  • show less
    References(13)

    [1] KAKIMOTO K, GAO B, LIU X et al. Growth of semiconductor silicon crystals. Progress in Crystal Growth and Characterization of Materials, 62, 273-285(2016).

    [2] LIU Y, LI M H et al. Secondary defects of As-grown oxygen precipitates in nitrogen doped Czochralski single crystal silicon. Materials Science in Semiconductor Processing, 163, 107583(2023).

    [3] FRIEDRICH J, JUNG T, TREMPA M et al. Considerations on the limitations of the growth rate during pulling of silicon crystals by the Czochralski technique for PV applications. Journal of Crystal Growth, 524, 125168(2019).

    [4] YU Y L, BAI X J, LI S Y et al. Review of silicon recovery in the photovoltaic industry. Current Opinion in Green and Sustainable Chemistry, 44, 100870(2023).

    [5] ZULEHNER W. Historical overview of silicon crystal pulling development. Materials Science and Engineering: B, 73, 7-15(2000).

    [6] SABANSKIS A, VIRBULIS J. Modelling of thermal field and point defect dynamics during silicon single crystal growth using CZ technique. Journal of Crystal Growth, 519, 7-13(2019).

    [7] DEZFOLI A R A. Czochralski (CZ) process modification with cooling tube in the response to market Global silicon shortage. Journal of Crystal Growth, 610, 127170(2023).

    [8] QI X F, WANG J L, WEN Y et al. Effect of water-cooled jacket on the oxygen transport during the Czochralski silicon crystal growth process. Journal of Crystal Growth, 609, 127139(2023).

    [9] JEON H J, PARK H, KOYYADA G et al. Optimal cooling system design for increasing the crystal growth rate of single-crystal silicon ingots in the czochralski process using the crystal growth simulation. Processes, 8, 1077(2020).

    [10] BORISOV D V, KALAEV V V. ILES of melt turbulent convection with conjugated heat transfer in the crucible and gas flow for Czochralski silicon crystal growth system. Journal of Crystal Growth, 573, 126305(2021).

    [11] SHEN T, WU C M, ZHANG L et al. Experimental investigation on effects of crystal and crucible rotation on thermal convection in a model Czochralski configuration. Journal of Crystal Growth, 438, 55-62(2016).

    [12] WARDEN G K, JUEL M, GAWEŁ B A et al. Recent developments on manufacturing and characterization of fused quartz crucibles for monocrystalline silicon for photovoltaic applications. Open Ceramics, 13, 100321(2023).

    [13] WATANABE M, KRAMER S. 450 mm silicon: an opportunity and wafer scaling. The Electrochemical Society Interface, 15, 28-31(2006).

    Tools

    Get Citation

    Copy Citation Text

    Litao ZHU, Lei LIU, Shuai YUAN, Shenglang ZHOU, Huali ZHANG, Chen WANG, Yu GAO, Jianwei CAO, Xuegong YU, Deren YANG. Effect of Cable Diameter on Growth Stability of Large-Size Czochralski Silicon Crystals[J]. Journal of Synthetic Crystals, 2025, 54(6): 942

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Mar. 1, 2025

    Accepted: --

    Published Online: Jul. 8, 2025

    The Author Email: Shuai YUAN (shuaiyuan@zju.edu.cn), Deren YANG (mseyang@zju.edu.cn)

    DOI:10.16553/j.cnki.issn1000-985x.2025.0027

    Topics