Laser & Optoelectronics Progress, Volume. 62, Issue 16, 1625001(2025)

Modeling and Analysis of Charge Overflow in Active Pixels Based on LOFIC Technology

Qiang Zhang1,2, Zhiyuan Gao1,2、*, Biao Ma1,2, Jing Gao1,2, and Jiangtao Xu1,2
Author Affiliations
  • 1School of Microelectronics, Tianjin University, Tianjin 300072, China
  • 2Tianjin Key Laboratory of Imaging and Sensing Microelectronic Technology, Tianjin 300072, China
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    References(17)

    [1] Nie X, Wang Z J, Wang B C et al. Experiment and analysis of damage of CMOS image sensor induced by proton irradiation with different bias conditions[J]. Acta Optica Sinica, 43, 1928001(2023).

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    Qiang Zhang, Zhiyuan Gao, Biao Ma, Jing Gao, Jiangtao Xu. Modeling and Analysis of Charge Overflow in Active Pixels Based on LOFIC Technology[J]. Laser & Optoelectronics Progress, 2025, 62(16): 1625001

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    Paper Information

    Category: OPTOELECTRONICS

    Received: Mar. 11, 2025

    Accepted: Mar. 25, 2025

    Published Online: Jul. 30, 2025

    The Author Email: Zhiyuan Gao (gaozhiyuan@tju.edu.cn)

    DOI:10.3788/LOP250798

    CSTR:32186.14.LOP250798

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