Laser & Optoelectronics Progress, Volume. 61, Issue 9, 0914002(2024)

Exposure Time Optimization of Laser Interference Direct Writing Device Based on MEMS Micromirror

Guanqun Yu1,2, Lü Baiying1, Yue Xu1, Zhongming Zeng1, and Dongmin Wu1,2、*
Author Affiliations
  • 1Nano-Fabrication Facility, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, Jiangsu , China
  • 2School of Material Science and Technology, ShanghaiTech University, Shanghai 201210, China
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    Guanqun Yu, Lü Baiying, Yue Xu, Zhongming Zeng, Dongmin Wu. Exposure Time Optimization of Laser Interference Direct Writing Device Based on MEMS Micromirror[J]. Laser & Optoelectronics Progress, 2024, 61(9): 0914002

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Apr. 17, 2023

    Accepted: May. 19, 2023

    Published Online: May. 15, 2024

    The Author Email: Dongmin Wu (dmwu2008@sinano.ac.cn)

    DOI:10.3788/LOP231088

    CSTR:32186.14.LOP231088

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