Fig. 1. Schematic diagram of system design

Fig. 2. Picture of the whole machine

Fig. 3. Two-dimensional MEMS micromirror scanning modes. (a) Quasi-static mode; (b) mixed mode (the slow and fast axes are in quasi-static and resonance modes, respectively); (c) both axes are in the resonance mode

Fig. 4. Schematic diagram of exposure time distortion

Fig. 5. Schematic diagram of line scanning

Fig. 6. Scanning time waveforms in a line. (a) Before correction; (b) after correction

Fig. 7. Control flowchart

Fig. 8. Schematic diagram of design pattern decomposition exposure correction

Fig. 9. Single pixel exposure experiment results at different exposure time. (a) 300 ms; (b) 500 ms; (c) 1000 ms; (d) 1500 ms;(e) 2000 ms; (f) 3000 ms

Fig. 10. Exposure time correction experimental results. (a) Design pattern; (b) 5 times optical microscope observation results; (c) (d) observation results in different perspectives

Fig. 11. Comparison of the pixel diameters before and after correction

Fig. 12. Exposure pattern. (a) Design pattern; (b) experimental result