Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching

Zijiang Yang; Qiao Pan; Jiacheng Zhu; Weimin Shen

doi:10.3788/AOS230446

Acta Optica Sinica, Volume. 43, Issue 13, 1305001(2023)

Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching

Zijiang Yang^1,2,3, Qiao Pan^1,2,3、*, Jiacheng Zhu^1,2,3, and Weimin Shen^1,2,3

Author Affiliations

¹Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province, Suzhou 215006, Jiangsu, China

²Key Lab of Modern Optical Technologies of Education Ministry of China, Suzhou 215006, Jiangsu, China

³School of Optoelectronic Science and Engineering, Soochow University, Suzhou 215006, Jiangsu, China

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Zijiang Yang, Qiao Pan, Jiacheng Zhu, Weimin Shen. Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching[J]. Acta Optica Sinica, 2023, 43(13): 1305001

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Paper Information

Category: Diffraction and Gratings

Received: Jan. 6, 2023

Accepted: Feb. 20, 2023

Published Online: Jul. 12, 2023

The Author Email: Pan Qiao (panqiao@suda.edu.cn)

DOI:10.3788/AOS230446

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology