Design and Control of Ultra-Precision Fine Positioning Stage for Scanning Beam Interference Lithography

Sen Lu; Kaiming Yang; Yu Zhu; Leijie Wang; Ming Zhang; Jin Yang

doi:10.3788/AOS201737.1012006

Acta Optica Sinica, Volume. 37, Issue 10, 1012006(2017)

Design and Control of Ultra-Precision Fine Positioning Stage for Scanning Beam Interference Lithography

Sen Lu^1,2, Kaiming Yang^1,2、*, Yu Zhu^1,2, Leijie Wang^1,2, Ming Zhang^1,2, and Jin Yang³

Author Affiliations

¹ State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China

² Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipments and Control, Tsinghua University, Beijing 100084, China

³ Basic Technology Research Department, Dongfeng Commercial Vehicle Technical Center, Wuhan, Hubei 430056, China

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Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang, Jin Yang. Design and Control of Ultra-Precision Fine Positioning Stage for Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2017, 37(10): 1012006

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Paper Information

Category: Instrumentation, Measurement and Metrology

Received: Apr. 5, 2017

Accepted: --

Published Online: Sep. 7, 2018

The Author Email: Kaiming Yang (yangkm@tsinghua.edu.cn)

DOI:10.3788/AOS201737.1012006

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology