Researching | Sidelobe suppression in light-sheet fluorescence microscopy with Bessel beam plane illumination using subtractive imaging

Chinese Optics Letters, Volume. 16, Issue 11, 111801(2018)

Sidelobe suppression in light-sheet fluorescence microscopy with Bessel beam plane illumination using subtractive imaging

Suhui Deng^1,2, Yiping Xiao¹, Jie Hu¹, Jianfang Chen³, Yuhao Wang¹, and Mingping Liu^1、*

Author Affiliations

¹School of Information Engineering, Nanchang University, Nanchang 330031, China

²Division of Physical Biology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China

³Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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Cited By

[1] Suhui Deng, Peng Wang, Yulong Zhang, Huilin Zhou, Jianzhong Yang, Mingping Liu. Subtraction method via phase mask enables contrast enhancement in scanned Bessel light-sheet microscopy. Journal of the Optical Society of America A, 37, 84(2020).

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Suhui Deng, Yiping Xiao, Jie Hu, Jianfang Chen, Yuhao Wang, Mingping Liu, "Sidelobe suppression in light-sheet fluorescence microscopy with Bessel beam plane illumination using subtractive imaging," Chin. Opt. Lett. 16, 111801 (2018)

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Paper Information

Category: Microscopy

Received: Jul. 26, 2018

Accepted: Sep. 29, 2018

Published Online: Nov. 11, 2018

The Author Email: Mingping Liu (mpliu@ncu.edu.cn)

DOI:10.3788/COL201816.111801

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology