Progress in CMOS-Compatible Fabrication Process of Dielectric Metasurfaces

Acta Optica Sinica, Volume. 43, Issue 8, 0822003(2023)

Chi Zhang and Shumin Xiao^*

School of Materials Science and Engineering, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, Guangdong , China

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Chi Zhang, Shumin Xiao. Progress in CMOS-Compatible Fabrication Process of Dielectric Metasurfaces[J]. Acta Optica Sinica, 2023, 43(8): 0822003

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Paper Information

Category: Optical Design and Fabrication

Received: Jan. 21, 2023

Accepted: Mar. 21, 2023

Published Online: Apr. 6, 2023

The Author Email: Xiao Shumin (shumin.xiao@hit.edu.cn)

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