[1] Chang T C, Cao X, Dedon L R et al. Optical design and stability study for ultrahigh-performance and long-lived vanadium dioxide-based thermochromic coatings[J]. Nano Energy, 44, 256-264(2018).

[2] Yao L, Qu Z, Pang Z L et al. Three-layered hollow nanospheres based coatings with ultrahigh-performance of energy-saving, antireflection, and self-cleaning for smart windows[J]. Small, 14, 1801661(2018).

[3] Gao Y F, Wang S B, Luo H J et al. Enhanced chemical stability of VO2 nanoparticles by the formation of SiO2/VO2 coreshell structures and the application to transparent and flexible VO2-based composite foils with excellent thermochromic properties for solar heat control[J]. Energ. Environ. Sci., 5, 6104-6110(2012).

[4] Garlisi C, Trepci E, Li X et al. Multilayer thin film structures for multifunctional glass: Self-cleaning, antireflective and energy-saving properties[J]. Appl. Energ., 264, 114697(2020).

[5] Xuan Z Y, Li J Y, Liu Q Qet. al. Artificial structural colors and applications[J]. The Innovation, 2, 100081(2021).

[6] Jaglarz J, Sanetra J, Cisowski J. Studies of polymer surface topography by means of optical profilometry[J]. Opt. Appl., 40, 767-772(2010).

[7] Kim D W, Kwon M, Park S et al. Measurement of the thickness and refractive index of a thin film by analyzing reflected interference fringes[J]. Appl. Optics, 62, 8018-8024(2023).

[8] Yu C J, Hung C H, Hsu K C et al. Phase-shift imaging ellipsometer for measuring thin-film thickness[J]. Microelectron Reliab, 55, 352-357(2015).

[9] Kal S, Kasko I, Ryssel H. Noncontacting measurement of thickness of thin titanium silicide films using spectroscopic ellipsometer[J]. IEEE Electr Device L, 19, 127-130(1998).

[10] Hassani K, Abbaszadeh K. Thin film characterization with a simple Stokes ellipsometer[J]. Eur. J. Phys., 36, 025017(2015).

[11] Kostejn M, Fajgar R, Drinek V et al. Determination of composition and thickness of MnSi and MnGe Layers by EDS[J]. J. Nondestruct Eval., 39, 1-11(2020).

[12] Franquet A, Conard T, Gilbert M et al. Thickness and composition measurements of nanoelectronics multilayer thin films by energy dispersive spectroscopy (EDS)[J]. J. Phys. Conf. Ser., 417, 012033(2013).

[13] Liu X X, Wang S W, Xia H et al. Interference-aided spectrum-fitting method for accurate film thickness determination[J]. Chin. Opt. Lett., 14, 081203(2016).

[14] Xie M B, Wu Z Y, Cui H Y et al. On-site determination of optical constants for thin films[J]. J. Infrared Millim. W., 41, 888-893(2022).

[15] Cui Z Z, Yan Y H, Liu Q Q et al. Accurate determination of low-dimensional materials' complex refractive index by cavity resonant method[J]. Opt. Mater., 131, 112682(2022).

[16] Yu Z, Li H, Zhong T et al. Wavefront shaping: A versatile tool to conquer multiple scattering in multidisciplinary fields[J]. The Innovation, 3, 100292(2022).

[17] Rademacher D, Vergöhl M, Richter U. In situ thickness determination of multilayered structures using single wavelength ellipsometry and reverse engineering[J]. Appl. Optics, 50, C222-C227(2011).

[18] Gudmundsson J T. Physics and technology of magnetron sputtering discharges[J]. Plasma Sources Sci. T., 29, 113001(2020).

[19] Depla D, Mahieu S, De Gryse R. Magnetron sputter deposition: Linking discharge voltage with target properties[J]. Thin Solid Films, 517, 2825-2839(2009).

[20] Colligon J S. Ion-assisted sputter deposition[J]. Philos. T. Roy. Soc. A, 362, 103-116(2004).

[21] Kelly P J, Arnell R D. Magnetron sputtering: a review of recent developments and applications[J]. Vacuum, 56, 159-172(2000).

[22] Carcia P F, Mclean R S, Reilly M H et al. Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering[J]. Appl. Phys. Lett., 82, 1117-1119(2003).

[23] Helmersson U, Lattemann M, Bohlmark J et al. Ionized physical vapor deposition (IPVD): A review of technology and applications[J]. Thin Solid Films, 513, 1-24(2006).

[24] Chang L, Liu X H, Luo J et al. Physiochemical coupled dynamic nanosphere lithography enabling multiple metastructures from single mask[J]. Adv. Mater., 36, 2310469(2024).