Journal of Infrared and Millimeter Waves, Volume. 43, Issue 6, 813(2024)

Study on multi-wavelength thin film thickness determination method

Ce SHI1,2,3,4, Mao-Bin XIE2,3,4, Wei-Bo ZHENG5, Ruo-Nan JI2,3,4, Shao-Wei WANG2,3,4、*, and Wei LU1,2,3、**
Author Affiliations
  • 1School of Physical Science and Technology,ShanghaiTech University,Shanghai 201210,China
  • 2State Key Laboratory of Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,Shanghai 200083,China
  • 3Shanghai Engineering Research Center of Energy-Saving Coatings,Shanghai 200083,China
  • 4Shanghai Key Laboratory of Optical Coatings and Spectral Modulation,Shanghai 200083,China
  • 5Shanghai Institute of Technical Physics,Chinese Academy of Sciences,Shanghai 200083,China
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    Figures & Tables(4)
    Schematic diagram of multi wavelength spectral reconstruction and film thickness fitting experiment
    (a)Comparison chart of measured reflectance and transmittance spectra before and after program calibration processing of Si3N4(283.2 nm)sample;(b)thickness fitting error between fitting thickness and SEM thickness of different samples before and after spectral calibration(using full spectrum data points)
    Spectral fitting images using 10 different wavelength information of coating samples with different material compositions:(a)reflectance spectrum;(b)transmittance spectrum;(c)thickness fitting error between fitting thickness and SEM thickness of different samples when using different numbers of data points for fitting
    • Table 1. Comparison table between the fitting thickness of the full spectrum method/multi wavelength method (Ten points) and the SEM thickness

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      Table 1. Comparison table between the fitting thickness of the full spectrum method/multi wavelength method (Ten points) and the SEM thickness

      film type

      SEM thickness

      (nm)

      full spectrum fitting thickness

      (nm)

      ten points fitting thickness

      (nm)

      ten points method deviation
      Si3N4_138.038.635.3-7.1%
      Si3N4_278.074.579.5+1.9%
      Si3N4_3142.5143.9136.9-3.9%
      Si3N4_4283.2283.8281.3-0.7%
      AZO_110.49.89.7-6.7%
      AZO_242.642.442.5-0.2%
      AZO_3137.7135.6133.8-2.8%
      AZO_4239.4235.7234.0-2.3%
      AZO/Ag/AZO54.6/14.7/43.754.6/14.7/43.754.6/14.9/43.7+1.4%
      Si3N4/NiCr/Si3N451.2/8.9/3951.2/8.9/3951.2/8.8/39-1.1%
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    Ce SHI, Mao-Bin XIE, Wei-Bo ZHENG, Ruo-Nan JI, Shao-Wei WANG, Wei LU. Study on multi-wavelength thin film thickness determination method[J]. Journal of Infrared and Millimeter Waves, 2024, 43(6): 813

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    Paper Information

    Category: Infrared Optoelectronic System and Application Technology

    Received: Feb. 26, 2024

    Accepted: --

    Published Online: Dec. 13, 2024

    The Author Email: Shao-Wei WANG (wangshw@mail.sitp.ac.cn), Wei LU (luwei@shanghaitech.edu.cn)

    DOI:10.11972/j.issn.1001-9014.2024.06.012

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