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Chinese Journal of Lasers, Volume. 51, Issue 7, 0701010(2024)

Research Progress of Beyond Extreme Ultraviolet Multilayers at 6.X nm

Xiaoran Li1...2, Hetao Tang1,2, Jiaoling Zhao2,* and Fenghua Li2 |Show fewer author(s)
Author Affiliations
  • 1School of Microelectronics, Shanghai University, Shanghai 200072, China
  • 2Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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    Article index updated: Aug. 15, 2025

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    Xiaoran Li, Hetao Tang, Jiaoling Zhao, Fenghua Li. Research Progress of Beyond Extreme Ultraviolet Multilayers at 6.X nm[J]. Chinese Journal of Lasers, 2024, 51(7): 0701010

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    Paper Information

    Category: laser devices and laser physics

    Received: Dec. 11, 2023

    Accepted: Feb. 6, 2024

    Published Online: Apr. 2, 2024

    The Author Email: Jiaoling Zhao (jolin923@siom.ac.cn)

    DOI:10.3788/CJL231495

    CSTR:32183.14.CJL231495

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology