Laser & Optoelectronics Progress, Volume. 62, Issue 7, 0700005(2025)

Technologies and Applications of Advanced Laser for Substrate Patterning

Jiaxiang Wang1, Gufeng He1, Faheng Zang1,2, Yunna Sun1,2, Zhuoqing Yang1,2、*, and Xiaojun Guo1,2、**
Author Affiliations
  • 1School of Integrated Circuits, Shanghai Jiao Tong University, Shanghai 200240, China
  • 2National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai 200240, China
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    Figures & Tables(20)
    CO2 laser patterned PMMA substrate. (a) Using excimer laser pulses (20 ns half-width) to ablate microchannels below 100 μm on PMMA[43]; (b) 10.6 μm infrared CO2 laser etching system[28]
    CO2 laser patterned PDMS substrate. (a) SEM image of a series of microchannels with different depths patterned on a PDMS substrate using CO2 laser[50]; (b) SEM image of a micro-pyramid array patterned on a PDMS substrate using femtosecond laser[29]
    CO2 laser patterned PI substrate. (a) SEM image of PI repaired by CO2 laser ablation[54]; (b) process diagram of synthesizing LIG on PI and corresponding patterned SEM image[30]; (c) LIG activation edge SEM image Cs-STEM image, scale bar is 2 nm[56]
    Laser patterned silicon substrate. (a) SEM image of nm-level trenches etched by ultraviolet laser[32]; (b) schematic diagram of femtosecond pulse laser-induced plasma etching equipment[58]; (c) cross-sectional STEM image of silicon near surface, no signs of laser-induced damage[58]
    Femtosecond laser patterned glass substrate[62]. (a) Optical image of 53 μm diameter TGV array etched by laser induction; (b) corresponding cross-sectional optical image of TGV
    SEM images of alµmina substrates cut using laser etching at different cutting speeds (the left is top view, the right is bottom view)[35]. (a) Cutting at speed of 0.2 mm/s; (b) cutting at speed of 1.5 mm/s
    Laser processing TGV-Micro-LED[69]. (a) Top-emitting micro-LED, using TGV interconnection to achieve interconnection on both sides of AB; (b) cross-sectional view of TGV blind hole with diameter of 70 µm
    Laser processing of 3D-TGV capacitors[70]. (a) SEM top view of 3D-TGV capacitor; (b) TGV cross-section with diameter of 80 μm; (c) TGV cross section after copper electroplating
    Laser processing TGV-accelerometer[71]. (a) Physical image of accelerometer wafer packaged in 3D-TGV wafer; (b) TGV electrical interconnection flow chart
    TGV-integrated antenna[72].(a) Perspective view; (b) top view
    Surface corresponding to the physical image of laser patterned PDMS-TENG and the SEM image of the surface microstructure[77]
    Photograph of large-scale laser patterned dielectric layer array and SEM image of micro-pyramid array[29]
    Laser processing of microneedle electrode arrays[78]. (a) Optical image and partial enlargement of the microneedle electrode array on the glass substrate; (b) side view microscopic image of gel-assisted etching of the copper hard mask at the microneedle tip; (c) select SEM image of the Au-coated microneedle tip after electrochemically etching the tip parylene coating; (d) SEM image of the microneedle tip after electrochemically depositing PtB on the tip
    Laser processing to manufacture LIG temperature sensors[79].(a) Physical image of LIG temperature sensor; (b) LIG temperature sensor processing flow chart
    Laser processing of open microfluidic devices[81]. (a) Schematic cross-section of the assembled open microfluidic device; (b) top view of the fabricated device from the side with its annular liquid guide and matching PMMA cover
    CO2 laser fabrication of microfluidic devices for droplet generation[82]. (a) Using CO2 laser engraving to develop microchannels and fabricate microfluidic devices for droplet generation; (b) optical microscope and SEM images of microchannel morphology
    Femtosecond laser processing to fabricate fused silica resonators. (a) Ablation SEM image of a hemispheric fused silica resonator and substrate after ablation separation using femtosecond laser[86]; (b) SEM image of a fused silica resonator fabricated using laser-induced combined chemical etching[34]
    Laser cutting aluminum oxide[89]. (a) Cross-sectional image obtained by combining Nd∶YAG laser and CO2 laser; (b) fracture surface roughness profile
    Liquid-assisted laser processing of silicon carbide through holes[90]. (a) Image of silicon carbide through holes processed by liquid-assisted laser processing; (b) relationship between through hole diameter and laser energy processed in air and water
    • Table 1. Different laser patterning processing for different substrate materials

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      Table 1. Different laser patterning processing for different substrate materials

      Substrate materialLaser typePrepare structureResolution /μmPublication timeCitation
      PMMAInfrared CO2 laserMicrochannel100201028
      PDMSFemtosecond laserPyramid array40202229
      PIInfrared CO2 laserOwl pattern20201430
      PVAInfrared CO2 laserPyramid array200202331
      SiliconUV laserMicrogroove70199532
      Quartz glassInfrared CO2 laserBlind hole53201933
      Fused quartzInfrared CO2 laserRing resonator/202234
      AluminaInfrared CO2 laserMicrogroove200201035
      SapphireInfrared CO2 laser/10202236
      PIUV laser//202437
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    Jiaxiang Wang, Gufeng He, Faheng Zang, Yunna Sun, Zhuoqing Yang, Xiaojun Guo. Technologies and Applications of Advanced Laser for Substrate Patterning[J]. Laser & Optoelectronics Progress, 2025, 62(7): 0700005

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    Paper Information

    Category: Reviews

    Received: Nov. 21, 2024

    Accepted: Dec. 11, 2024

    Published Online: Apr. 10, 2025

    The Author Email: Zhuoqing Yang (yzhuoqing@sjtu.edu.cn), Xiaojun Guo (x.guo@sjtu.edu.cn)

    DOI:10.3788/LOP242294

    CSTR:32186.14.LOP242294

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