Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Optical Communication Technology, Volume. 49, Issue 1, 94(2025)

Design of film thickness and curvature measurement system based on ellipsometry spectrum and optical lever method

SUN Wei1, JIN Shangzhong1, ZHANG Yin2, SUN Zijuan2, and XU Sheng2
Author Affiliations
  • 1College of Optical and electronic technology, China Jiliang University, Hangzhou 310018, China
  • 2Suzhou Peaktra Technology Co., Ltd., Suzhou Jiangsu 215004, China
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (7)
    Tools
    Paper Information
    Topics
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    SUN Wei, JIN Shangzhong, ZHANG Yin, SUN Zijuan, XU Sheng. Design of film thickness and curvature measurement system based on ellipsometry spectrum and optical lever method[J]. Optical Communication Technology, 2025, 49(1): 94

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category:

    Received: Feb. 6, 2024

    Accepted: Jun. 17, 2025

    Published Online: Jun. 17, 2025

    The Author Email:

    DOI:10.13921/j.cnki.issn1002-5561.2025.01.016

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology