In the dense wavelength division multiplexing system, when adjusting the process using a narrowband filter, it is necessary to measure the thickness, thickness distribution, and residual stress of a single layer of film. To solve the complexity and repeated positioning errors introduced by the need to use multiple systems for measurement, a measurement system based on ellipsometry spectrum and the optical lever method is introduced, which successfully achieved precise measurement of these parameters on a single integrated device. The experimental results show that the thickness deviation measured by the designed measurement system is less than 0.21%, the thickness distribution deviation is less than 0.025%, the curvature and the residual stress deviation is within ±1°. The system can meet the actual measurement needs.