Opto-Electronic Engineering, Volume. 38, Issue 9, 50(2011)
Sliding Mode Control of Macro-micro System for Wafer Stage of Lithography
To improve the tracking precision and respond speed, a macro-micro control structure is chosen and the actuators are the linear motor and voice motor. The micro stage accomplishes the short-stroke movement and ensures the high tracking precision, and the macro stage makes large-stroke movement to keep that the voice motor is not closed to saturation. The control system is designed based on sliding mode control theory to ensure the robust of the control system. In order to achieve low-pass effect, an optimal integral sliding surface is designed based on frequency-shaped method. A variable gain switch control law is introduced to reduce chattering. Simulation results show that the maximum position tracking error and standard deviation is 8.7 nm and 2.2 nm during the scanning exposure process. Scanning speed is smooth and high frequency components of position error signal have been reduced effectively.
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WU Zhi-peng, CHEN Xing-lin, LIU Chuan. Sliding Mode Control of Macro-micro System for Wafer Stage of Lithography[J]. Opto-Electronic Engineering, 2011, 38(9): 50
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Received: May. 25, 2011
Accepted: --
Published Online: Sep. 27, 2011
The Author Email: Zhi-peng WU (elva_w@yahoo.com.cn)