Infrared and Laser Engineering, Volume. 51, Issue 7, 20210688(2022)
Preparation method of silicon-based aspheric cylindrical microlens array
[1] Yuan Qun, Ji Wen, Gao Zhishan. Geometric characteristics and error analysis of standard spherical lenses[J]. Applied Optics, 41, 857-867(2020).
[2] [2] Huang Ziyue, Deng Yu, Ji Xiaoling. The influence of spherical aberration on the beam quality of highpower laser beams in the upward atmosphere [J]. Acta Physica Sinica, 2021, 70(23): 234202. (in Chinese)
[3] Sheng Shuwu, Li Linhai, Xin Zhihui, . Uncertainty analysis of convex lens focal length measurement and system deviation correction[J]. Acta Optica Sinica, 41, 1412001(2021).
[4] Zhang Guangwei, Zhang Xinting. Design of large numerical aperture extreme ultraviolet lithography objective lens[J]. Science Technology and Engineering, 13, 9619-9621, 9640(2013).
[5] Chen Sujuan, Chen Jiexiang, Xu Mingming. Large numerical aperture dielectric structure lens[J]. Infrared and Laser Engineering, 43, 479-482(2014).
[6] Zhu Kejun, Yin Shaohui, Yu Jianwu, . Finite element analysis of aspheric glass lens compression molding[J]. China Mechanical Engineering, 24, 2509-2514(2013).
[7] Liu Xiangyang. Design method of aspheric microlens prepared by hot melt photoresist method[J]. Acta Optica Sinica, 39, 0208001(2019).
[8] Zhou Tianfeng, Xie Jiaqing, Liang Zhiqiang, . Research progress and prospects of optical microlens array compression molding[J]. Chinese Optics, 10, 603-618, 703(2017).
[9] [9] Chen Bo, Guo Lurong, Tang Jiyue, et al. Novel method f making microopticselements with continuous relief [J]. Chinese Journal of Lasers B,1997, 6(1): 5763.
[10] Zeng Hongjun, Chen Bo, Guo Lurong. Frame effect and its application in mask moving technology[J]. Optoelectronic Engineering, 27, 19-22(2000).
[11] Ye Hong, Wu Huilong. Analysis of typical problems in mask manufacturing process[J]. Research and Progress in Solid State Electronics, 29, 606-607, 614(2009).
[12] Liu Zhijing, Liu Chen. Lithography and plasma etching technology[J]. Physics, 45-49(1999).
[13] Jin Min, Wang Fang. Research on the coating and edge scraping process of photoresist on wafer surface[J]. Mechanical Management Development, 35, 55-56(2020).
[14] Wang Jiaji. The influence of mask deformation on the accuracy of graphics[J]. Semiconductor Technology, 20-24(1988).
[15] Zhou Hong, Lai Jianjun, Zhao Yue, . SF_ 6/O_ 2/CHF_ 3 Reactive ion etching of silicon in mixed gases[J]. Semiconductor Technology, 28-31(2005).
Get Citation
Copy Citation Text
Changda Zhang, Mingyou Gao, Yan Zhou, Xiaozhou Deng, Xin Xiong, Fenglei Liu, Weiguo Zhang. Preparation method of silicon-based aspheric cylindrical microlens array[J]. Infrared and Laser Engineering, 2022, 51(7): 20210688
Category: Optical fabrication
Received: Sep. 17, 2021
Accepted: --
Published Online: Dec. 20, 2022
The Author Email: