Chinese Journal of Lasers, Volume. 43, Issue 10, 1003001(2016)
Influence of Oxygenating Port Position on Properties of HfO2 Films Deposited by Electron Beam Evaporation
Figures & Tables(0)
Tools
Get Citation
Copy Citation Text
Zheng Ruxi, Yi Kui, Fan Zhengxiu, Shao Jianda, Tu Feifei. Influence of Oxygenating Port Position on Properties of HfO2 Films Deposited by Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2016, 43(10): 1003001
Paper Information
Category: materials and thin films
Received: Apr. 18, 2016
Accepted: --
Published Online: Oct. 12, 2016
The Author Email: Ruxi Zheng (rxzheng@siom.ac.cn)
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20