Acta Photonica Sinica, Volume. 53, Issue 9, 0913002(2024)
Process Development of Low-loss Thick Silicon Nitride Waveguide on 8-inch Wafer
Fig. 9. Checkered morphology under layout, optical microscopy, and scanning electron microscopy
Fig. 12. The measurement result of the Si3N4 waveguide with a cross-sectional size of 0.8 µm×0.8 µm
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Qingyu CONG, Zhaoyi LI, Jingjie ZHOU, Zuowen FAN, Lianxi JIA, Ting HU. Process Development of Low-loss Thick Silicon Nitride Waveguide on 8-inch Wafer[J]. Acta Photonica Sinica, 2024, 53(9): 0913002
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Received: Feb. 2, 2024
Accepted: Apr. 1, 2024
Published Online: Nov. 13, 2024
The Author Email: Lianxi JIA (jlxlianye@gmail.com)