Acta Photonica Sinica, Volume. 53, Issue 9, 0913002(2024)

Process Development of Low-loss Thick Silicon Nitride Waveguide on 8-inch Wafer

Qingyu CONG, Zhaoyi LI, Jingjie ZHOU, Zuowen FAN, Lianxi JIA*, and Ting HU
Author Affiliations
  • School of Microelectronics, Shanghai University, Shanghai 200444, China
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    Figures & Tables(18)
    Schematic cross-section of a rectangular Si3N4 waveguide
    Modes simulation model in Lumerical
    Bending radius simulation
    Schematic of inverse tapered edge coupler
    The simulation of the coupling efficiency
    Cut-back structure for transmission loss testing
    Structure for bending loss testing
    The fabrication process flow of the Si3N4 waveguide
    Checkered morphology under layout, optical microscopy, and scanning electron microscopy
    Silicon nitride waveguide cross-section image
    Semi-automatic test platform
    The measurement result of the Si3N4 waveguide with a cross-sectional size of 0.8 µm×0.8 µm
    The 8-inch wafer
    • Table 1. Parameters of the cut-back structure

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      Table 1. Parameters of the cut-back structure

      NumberLength/cmBend waveguide radius R/μm
      Waveguide 112.72100
      Waveguide 217.62100
      Waveguide 322.52100
      Waveguide 427.42100
    • Table 2. Structural parameters of the bending waveguides

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      Table 2. Structural parameters of the bending waveguides

      Bend waveguide radiusBendNumber of 90° arcs
      50 μmBend 124
      Bend 272
      Bend 3120
      Bend 4168
      80 μmBend 124
      Bend 272
      Bend 3120
      Bend 4168
    • Table 3. Transmission and coupling losses of silicon nitride waveguide in the wavelength range of 1 490~1 580 nm

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      Table 3. Transmission and coupling losses of silicon nitride waveguide in the wavelength range of 1 490~1 580 nm

      Wavelength/nmTransmission loss/(dB·cm-1Coupling loss/dB
      1 4900.258 57.27
      1 5000.297 27.33
      1 5100.292 17.28
      1 5200.2287.21
      1 5300.154 46.98
      1 5400.1167.26
      1 5500.0876.87
      1 5600.0766.946
      1 5700.067 26.867
      1 5800.0626.83
    • Table 4. Propagation losses at 1 550 nm for Si3N4 waveguides

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      Table 4. Propagation losses at 1 550 nm for Si3N4 waveguides

      TeamWafer size/inchDeposition methodWaveguide cross-section dimensions/μm2Transmission loss
      HUANG Ying88PECVD0.4×1.03.75 dB/cm@1 550 nm
      SHENG Chunmao198PECVD0.4×0.72.1 dB/cm@1 550 nm
      WANG Linghua204PECVD0.6×1.50.58 dB/cm@1 550 nm
      KRÜCKEL C Jl94LPCVD0.7×1.651.0 dB/cm@1 550 nm
      EPPING J P 134LPCVD0.9×1.20.4 dB/cm@1 560 nm
      LIU Junqiu 144LPCVD0.9×2.10.015 dB/cm@1 630 nm
      This work8LPCVD0.8×0.80.087 dB/cm@1 550 nm
    • Table 5. Transmission loss of 800 nm thick silicon nitride waveguides at different positions on the 8-inch wafer

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      Table 5. Transmission loss of 800 nm thick silicon nitride waveguides at different positions on the 8-inch wafer

      LocationTransmission loss/(dB/cm@1 550 nm)Coupling loss/dB
      C20.0927.04
      C40.0876.87
      C60.0937.13
      A40.0896.72
      E40.127.23
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    Qingyu CONG, Zhaoyi LI, Jingjie ZHOU, Zuowen FAN, Lianxi JIA, Ting HU. Process Development of Low-loss Thick Silicon Nitride Waveguide on 8-inch Wafer[J]. Acta Photonica Sinica, 2024, 53(9): 0913002

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    Paper Information

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    Received: Feb. 2, 2024

    Accepted: Apr. 1, 2024

    Published Online: Nov. 13, 2024

    The Author Email: Lianxi JIA (jlxlianye@gmail.com)

    DOI:10.3788/gzxb20245309.0913002

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