[1] Wu T, Wang Q, Chen L A et al. Study of the 6.x nm short wavelength radiation spectra of laser-produced erbium plasmas for BEUV lithography[J]. Plasma Science and Technology, 25, 065501(2023).

[2] Li Y Q, Nan Y B, Chen Y Q et al. Research and progress on optical design of exposure systems in extreme ultraviolet lithography[J]. Acta Optica Sinica, 43, 1522002(2023).

[3] Li X R, Tang H T, Zhao J L et al. Research progress of beyond extreme ultraviolet multilayers at 6.X nm[J]. Chinese Journal of Lasers, 51, 0701010(2024).

[4] Uzoma P C, Shabbir S, Hu H et al. Multilayer reflective coatings for BEUV lithography: a review[J]. Nanomaterials, 11, 2782(2021).

[5] Glushkov D, Banine V Y, Sjmaenok L A et al. Multilayer mirror and lithographic apparatus[P].

[6] Liu X Y, Zhang Z, Jiang L et al. Thickness control and thermal stability of large-diameter mo/si multilayer films for extreme ultraviolet source[J]. Chinese Journal of Lasers, 51, 0701014(2024).

[7] Louis E, Yakshin A E, Tsarfati T et al. Nanometer interface and materials control for multilayer EUV-optical applications[J]. Progress in Surface Science, 86, 255-294(2011).

[8] Tsarfati T, van de Kruijs R W E, Zoethout E et al. Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics[J]. Thin Solid Films, 518, 7249-7252(2010).

[9] Naujok P, Yulin S, Bianco A et al. La/B4C multilayer mirrors with an additional wavelength suppression[J]. Optics Express, 23, 4289-4295(2015).

[10] Naujok P, Yulin S, Müller R et al. Interface characterization in B-based multilayer mirrors for next generation lithography[J]. Thin Solid Films, 612, 414-418(2016).

[11] Andreev S S, Barysheva M M, Chkhalo N I et al. Multilayered mirrors based on La/B4C(B9C) for X-ray range near anomalous dispersion of boron (λ≈6.7 nm)[J]. Nuclear Instruments and Methods in Physics Research Section A, 603, 80-82(2009).

[12] Chkhalo N I, Künstner S, Polkovnikov V N et al. High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography[J]. Applied Physics Letters, 102, 011602(2013).

[13] Michette A G[M]. Optical system for soft X rays(2012).

[14] Zhu J T, Ji B, Zhu J et al. Studies on the stress and thermal properties of Mo/B4C and MoxC1-x/B4C multilayers[J]. Materials Research Express, 7, 036403(2020).

[15] Sakhonenkov S S, Bugaev A V, Shaposhnikov R A et al. Chemical interactions at interfaces in nanoscale Mo/B4C multilayered structures[J]. Surfaces and Interfaces, 55, 105467(2024).

[16] Shaposhnikov R, Polkovnikov V, Garakhin S et al. Investigation of structural and reflective characteristics of short-period Mo/B4C multilayer X-ray mirrors[J]. Journal of Synchrotron Radiation, 31, 268-275(2024).

[17] Li M F, Wen X L, Hu H et al. Effect of low nitrogen concentration on reactive RF sputtering of boron[J]. Vacuum, 219, 112741(2024).

[18] Penkov O V, Kopylets I A, Kondratenko V V et al. Synthesis and structural analysis of Mo/B periodical multilayer X-ray mirrors for beyond extreme ultraviolet optics[J]. Materials & Design, 198, 109318(2021).

[19] Fan Z X, Shao J D, Yi K et al[M]. Optical film and its application(2014).

[20] Zhang L L, Han X Q, Xie W L et al. High-precision extreme ultraviolet reflectometry based on normalization[J]. Chinese Journal of Lasers, 51, 0701015(2024).