Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Acta Optica Sinica, Volume. 45, Issue 15, 1536001(2025)

La/B4C-Based Multilayers with High-Reflectance at 6.X nm for BEUV Lithography of Next Generation

Jiaoling Zhao1,2, Xiaoran Li1,2、*, Hetao Tang1, Fenghua Li1,2, Wenjie Xu3, Tonglin Huo3, and Jianda Shao1,2
Author Affiliations
  • 1Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, Anhui , China
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (5)
    Equations (0)
    References (20)
    Tools
    Paper Information
    Topics
    Figures & Tables(5)
    Measured XRR curves of La/B4C-based multilayer films with different structures. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C/(La/C/B4C)100|air; (c) Sub|B4C/(La/C/B4C/C)100|air; (d) Sub|B4C/(La/B4C/C)100|air

    Fig. 1. Measured XRR curves of La/B4C-based multilayer films with different structures. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C/(La/C/B4C)100|air; (c) Sub|B4C/(La/C/B4C/C)100|air; (d) Sub|B4C/(La/B4C/C)100|air

    Download full size
    Measured and fitted XRR curves of La/B4C and La/C/B4C multilayers. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C/(La/C/B4C)100|air

    Fig. 2. Measured and fitted XRR curves of La/B4C and La/C/B4C multilayers. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C/(La/C/B4C)100|air

    Download full size
    Measured and fitted reflectivity curves at 6.63 nm for La/B4C and La/C/B4C multilayers with varying grazing angles. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C /(La/C/B4C)100|air

    Fig. 3. Measured and fitted reflectivity curves at 6.63 nm for La/B4C and La/C/B4C multilayers with varying grazing angles. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C /(La/C/B4C)100|air

    Download full size
    HRTEM images of La/B4C and La/C/B4C multilayers. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C /(La/C/B4C)100| air

    Fig. 4. HRTEM images of La/B4C and La/C/B4C multilayers. (a) Sub|B4C/(La/B4C)100|air; (b) Sub|B4C /(La/C/B4C)100| air

    Download full size
    Measured and calculated reflectivity curves of La/C/B4C multilayer at 6.X nm waveband with 250 periods

    Fig. 5. Measured and calculated reflectivity curves of La/C/B4C multilayer at 6.X nm waveband with 250 periods

    Download full size
    Tools

    Get Citation

    Copy Citation Text

    Jiaoling Zhao, Xiaoran Li, Hetao Tang, Fenghua Li, Wenjie Xu, Tonglin Huo, Jianda Shao. La/B4C-Based Multilayers with High-Reflectance at 6.X nm for BEUV Lithography of Next Generation[J]. Acta Optica Sinica, 2025, 45(15): 1536001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Letters

    Received: Mar. 14, 2025

    Accepted: May. 9, 2025

    Published Online: Aug. 7, 2025

    The Author Email: Xiaoran Li (w16a2z@163.com)

    DOI:10.3788/AOS250743

    CSTR:32393.14.AOS250743

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology