Photomask Inspection in Integrated Circuits Using Structured Illumination Microscopy

Xin Wei; Zexu Liu; Ziyi Zhang; Yunyi Chen; Wenhe Yang; Jing Cao; Nan Lin

doi:10.3788/AOS240585

Acta Optica Sinica, Volume. 44, Issue 11, 1118001(2024)

Photomask Inspection in Integrated Circuits Using Structured Illumination Microscopy

Xin Wei^1,2,3, Zexu Liu^2,3, Ziyi Zhang^2,3, Yunyi Chen^1,2,3, Wenhe Yang^1,2,3, Jing Cao^2,3、*, and Nan Lin^1,2,3

Author Affiliations

¹School of Microelectronics, Shanghai University, Shanghai 200444, China

²State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

³Key Laboratory of Ultra-intense Laser Science and Technology (CAS), Shanghai 201800, China

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References(20)

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Xin Wei, Zexu Liu, Ziyi Zhang, Yunyi Chen, Wenhe Yang, Jing Cao, Nan Lin. Photomask Inspection in Integrated Circuits Using Structured Illumination Microscopy[J]. Acta Optica Sinica, 2024, 44(11): 1118001

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Paper Information

Category: Microscopy

Received: Jan. 29, 2024

Accepted: Mar. 8, 2024

Published Online: Jun. 7, 2024

The Author Email: Cao Jing (caojing0606@siom.ac.cn)

DOI:10.3788/AOS240585

CSTR:32393.14.AOS240585

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology