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Chinese Journal of Lasers, Volume. 46, Issue 4, 0404001(2019)

Simulation of Scattering Characteristics of Micro- and Nano-Scale Defects in Sapphire Wafer

Jie Cheng1、*, Xiangning Wang1, Yongliang Xiao2, and Gengsheng Yu1、*
Author Affiliations
  • 1 School of Materials Science and Engineering, Xiangtan University, Xiangtan, Hunan 411105, China
  • 2 School of Physics and Optoelectronics, Xiangtan University, Xiangtan, Hunan 411105, China
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    CLP Journals

    [1] . Research progress on artificially prepared infrared extinction materials and their extinction properties(Invited)[J]. Infrared and Laser Engineering, 2020, 49(7): 20201018

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    Jie Cheng, Xiangning Wang, Yongliang Xiao, Gengsheng Yu. Simulation of Scattering Characteristics of Micro- and Nano-Scale Defects in Sapphire Wafer[J]. Chinese Journal of Lasers, 2019, 46(4): 0404001

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    Paper Information

    Category: measurement and metrology

    Received: Aug. 28, 2018

    Accepted: Dec. 26, 2018

    Published Online: May. 9, 2019

    The Author Email:

    DOI:10.3788/CJL201946.0404001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology