Chinese Journal of Lasers, Volume. 46, Issue 4, 0404001(2019)

Simulation of Scattering Characteristics of Micro- and Nano-Scale Defects in Sapphire Wafer

Jie Cheng1、*, Xiangning Wang1, Yongliang Xiao2, and Gengsheng Yu1、*
Author Affiliations
  • 1 School of Materials Science and Engineering, Xiangtan University, Xiangtan, Hunan 411105, China
  • 2 School of Physics and Optoelectronics, Xiangtan University, Xiangtan, Hunan 411105, China
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    Figures & Tables(8)
    Coordinate system of spherical particle scattering
    Simulation model of laser detection system for microsphere defect
    Scattering light intensity distributions of SiO2 microsphere defect with different sizes at different receiving positions
    Spatial scattering light intensity distributions of Al microsphere defect with different sizes. (a) q=75;(b) q=50;(c) q=25;(d) q=10
    Spatial scattering light intensity distributions of SiO2 microsphere defect at different incident wavelengths
    Spatial scattering light intensity distributions of SiO2 microsphere defect with different sizes when λ is 350 nm. (a) q=20, R=1.11 mm;(b) q=10, R=0.56 mm
    • Table 1. Ripple number of scattering light for defects with different sizes at different scattering angles θ

      View table

      Table 1. Ripple number of scattering light for defects with different sizes at different scattering angles θ

      qθ=30°θ=45°θ=60°θ=90°θ=120°
      CrestTroughCrestTroughCrestTroughCrestTroughCrestTrough
      100121113141213101077
      504566665543
      253333232321
    • Table 2. Ripple number of scattered light for defects with different sizes when θ is 45°

      View table

      Table 2. Ripple number of scattered light for defects with different sizes when θ is 45°

      qm=0.56m=0.83m=0.82+2.0im=1.4
      CrestTroughCrestTroughCrestTroughCrestTrough
      7510910911101111
      5066667678
      2533334334
      1011111221
      511011111
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    Jie Cheng, Xiangning Wang, Yongliang Xiao, Gengsheng Yu. Simulation of Scattering Characteristics of Micro- and Nano-Scale Defects in Sapphire Wafer[J]. Chinese Journal of Lasers, 2019, 46(4): 0404001

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    Paper Information

    Category: measurement and metrology

    Received: Aug. 28, 2018

    Accepted: Dec. 26, 2018

    Published Online: May. 9, 2019

    The Author Email:

    DOI:10.3788/CJL201946.0404001

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