Chinese Journal of Lasers, Volume. 46, Issue 4, 0404001(2019)
Simulation of Scattering Characteristics of Micro- and Nano-Scale Defects in Sapphire Wafer
Fig. 3. Scattering light intensity distributions of SiO2 microsphere defect with different sizes at different receiving positions
Fig. 4. Spatial scattering light intensity distributions of Al microsphere defect with different sizes. (a) q=75;(b) q=50;(c) q=25;(d) q=10
Fig. 5. Spatial scattering light intensity distributions of SiO2 microsphere defect at different incident wavelengths
Fig. 6. Spatial scattering light intensity distributions of SiO2 microsphere defect with different sizes when λ is 350 nm. (a) q=20, R=1.11 mm;(b) q=10, R=0.56 mm
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Jie Cheng, Xiangning Wang, Yongliang Xiao, Gengsheng Yu. Simulation of Scattering Characteristics of Micro- and Nano-Scale Defects in Sapphire Wafer[J]. Chinese Journal of Lasers, 2019, 46(4): 0404001
Category: measurement and metrology
Received: Aug. 28, 2018
Accepted: Dec. 26, 2018
Published Online: May. 9, 2019
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