Journal of Infrared and Millimeter Waves, Volume. 39, Issue 1, 56(2020)

A 3.0 THz detector in 65 nm standard CMOS process

Tong FANG1,3, Li-Yuan LIU1,3、*, Zhao-Yang LIU1,3, Peng FENG1,3, Yuan-Yuan LI2,3, Jun-Qi LIU2,3, Jian LIU1,3, and Nan-Jian WU1,3
Author Affiliations
  • 1State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing00083, China
  • 2Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing100083, China
  • 3Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, China
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    Figures & Tables(15)
    电磁波大气衰减图(大气压力为101.300 kPa、温度为15℃、水汽密度为7.5g/m3)
    探测器结构图
    NMOS场效应晶体管沟道中太赫兹波衰减仿真图
    仿真的归一化功率和辐射效率随金属层的变化曲线
    (a)贴片天线的仿真模型,(b)模型(a)的归一化功率及辐射效率仿真结果
    芯片照片及3.0 THz天线照片(左图标记部分)
    扫描光源光斑实验装置示意图
    (a)单像素偏置在0.23 V时的光斑扫描图(20 μm的扫描步长),(b)为光斑的水平横截面图
    芯片噪声电压测量示意图
    [in Chinese]
    太赫兹透射成像系统示意图
    扫描的牙签的成像图(100 μm 步长),(a)为牙签的实物照片,(b)为牙签扫描结果,(c)显示了扫描的尺寸,(d)是(b)的单行数据显示结果
    使用CMOS探测器扫描的树叶的成像图(100 μm 步长),(a)为待成像树叶,(b)为扫描成像结果,(c)为(b)的局部放大结果
    高莱探测器树叶扫描成像图(100 μm 步长),(a)为THz-QCL打开时采集到的数据即树叶加背底,(b)为THz-QCL关闭状态采集到的数据即背底,(c)为图(a)减去图(b)得到的树叶图,(d)为采用CMOS探测器扫描得到的树叶图
    • Table 1. 高频CMOS太赫兹探测器之间的性能比较

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      Table 1. 高频CMOS太赫兹探测器之间的性能比较

      CMOS工艺频率.[THz]Rv [V/W]NEP [pW/Hz1/2

      参考

      文献.

      65 nm CMOS3.052673本工作
      90 nm CMOS4.7575404[31]
      90 nm CMOS4.25230110[32]
      90 nm CMOS2.54, 3.13336, 30863,85[33]
      90 nm CMOS3.123085[34]
      130 nm CMOS(SBD)4.92383430[35]
      150 nm CMOS2.930487[36]
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    Tong FANG, Li-Yuan LIU, Zhao-Yang LIU, Peng FENG, Yuan-Yuan LI, Jun-Qi LIU, Jian LIU, Nan-Jian WU. A 3.0 THz detector in 65 nm standard CMOS process[J]. Journal of Infrared and Millimeter Waves, 2020, 39(1): 56

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    Paper Information

    Category: Millimeter Wave and Terahertz Technology

    Received: May. 8, 2019

    Accepted: --

    Published Online: Mar. 12, 2020

    The Author Email: Li-Yuan LIU (liuly@semi.ac.cn)

    DOI:10.11972/j.issn.1001-9014.2020.01.009

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