Acta Optica Sinica, Volume. 38, Issue 1, 105001(2018)

A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition

Zhang Heng1,2、*, Li Sikun1,2, and Wang Xiangzhao1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    CLP Journals

    [1] LI Guannan, LIU Lituo, ZHOU Weihu, SHI Junkai, CHEN Xiaomei. Study of Defect Perturbation in Reflective Field of EUV Mask Multilayer[J]. Semiconductor Optoelectronics, 2020, 41(2): 217

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    Zhang Heng, Li Sikun, Wang Xiangzhao. A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition[J]. Acta Optica Sinica, 2018, 38(1): 105001

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    Paper Information

    Category: Diffraction and Gratings

    Received: Jun. 28, 2017

    Accepted: --

    Published Online: Jan. 22, 2018

    The Author Email: Zhang Heng (zhangheng@siom.ac.cn)

    DOI:10.3788/aos201838.0105001

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