Acta Optica Sinica, Volume. 38, Issue 1, 105001(2018)
A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition
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Zhang Heng, Li Sikun, Wang Xiangzhao. A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition[J]. Acta Optica Sinica, 2018, 38(1): 105001
Paper Information
Category: Diffraction and Gratings
Received: Jun. 28, 2017
Accepted: --
Published Online: Jan. 22, 2018
The Author Email: Heng Zhang (zhangheng@siom.ac.cn)
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