Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

APPLIED LASER, Volume. 43, Issue 5, 70(2023)

Research on the Process of Marking DM Code on Silicon Wafer by 355 nm UV Laser

Chen Yuan1,2, Zhang Lingling1,2, Li Guoqi1,2, Du Yuanchao1,2, Shu Tianjiao1,2, and Wu Yang1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF
    Figures&Tables (0)
    Equations (0)
    References (3)
    Tools
    Paper Information
    Topics
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    Chen Yuan, Zhang Lingling, Li Guoqi, Du Yuanchao, Shu Tianjiao, Wu Yang. Research on the Process of Marking DM Code on Silicon Wafer by 355 nm UV Laser[J]. APPLIED LASER, 2023, 43(5): 70

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Received: Feb. 24, 2022

    Accepted: --

    Published Online: Feb. 2, 2024

    The Author Email:

    DOI:10.14128/j.cnki.al.20234305.070

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology