Influence of Sputtering Power on Optical Quality of Thin Film

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Acta Optica Sinica, Volume. 22, Issue 11, 1300(2002)

[in Chinese]^1、*, [in Chinese]¹, [in Chinese]¹, [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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References(5)

[1] [1] Vernon S P, Stearns D G, Rosen B S. Ion-assisted sputter deposition of molybdenum-silicon multilayers. Appl. Opt., 1993, 32(34):6969～6974

[2] [2] Boher P, Houdy Ph, Hennet L et al.. Magnesium silicide based multilayers for soft X-ray optics. Proc. SPIE, 1991, 1546:502～518

[3] [3] Stearns D G, Rose R S, Verns S P. Multiplayer mirror technology for soft X-ray projection lithography. Appl. Opt., 1993, 32(34):6952～6960

[4] [4] Siaughter J M, Schulze D W. Structure and performance of Mo/Si multiplayer mirrors for the extreme ultraviolet. J. Appl. Phys., 1994, 76(4):2144～2154

[5] [5] England C D, Bennett W R, Falco C M. Magnetic and structural characterization of copper/cobat multilayers. J. Appl. Phys., 1988, 64(10):15～20

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of Sputtering Power on Optical Quality of Thin Film[J]. Acta Optica Sinica, 2002, 22(11): 1300

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Paper Information

Category: Thin Films

Received: Jan. 4, 2002

Accepted: --

Published Online: Aug. 8, 2006

The Author Email: (feng-shimeng@163.net)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology