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High Power Laser Science and Engineering, Volume. 11, Issue 5, 05000e64(2023)

Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review

Nan Lin1,2、*, Yunyi Chen1,2, Xin Wei1,2, Wenhe Yang1,2, and Yuxin Leng2、*
Author Affiliations
  • 1School of Microelectronics, Shanghai University, Shanghai, China
  • 2Department of Precision Optics Engineering, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
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    Article index updated:Apr. 27, 2024

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    Nan Lin, Yunyi Chen, Xin Wei, Wenhe Yang, Yuxin Leng. Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review[J]. High Power Laser Science and Engineering, 2023, 11(5): 05000e64

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    Paper Information

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    Received: Mar. 22, 2023

    Accepted: Jun. 20, 2023

    Published Online: Oct. 7, 2023

    The Author Email: Nan Lin (nanlin@siom.ac.cn), Yuxin Leng (lengyuxin@mail.siom.ac.cn)

    DOI:10.1017/hpl.2023.53

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology