Laser & Optoelectronics Progress, Volume. 56, Issue 6, 060001(2019)

Hole Injection Efficiency Improvement for AlGaN-Based Deep Ultraviolet Light-Emitting Diodes

Kangkai Tian1,2, Chunshuang Chu1,2, Wengang Bi1,2, Yonghui Zhang1,2、**, and Zihui Zhang1,2、*
Author Affiliations
  • 1 Institute of Micro-Nano Photoelectron and Electromagnetic Technology Innovation, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300401, China
  • 2 Key Laboratory of Electronic Materials and Devices of Tianjin, Tianjin 300401, China
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    Figures & Tables(16)
    Schematic of epitaxial structure for DUV LED
    Simulation results. (a) Relative dielectric constant of AlxGa1-xN layer versus AlN composition; (b) electric fields in tunneling regions for devices A1 and A2 at equilibrium (Inset shows peak field intensity versus polarization level). Reproduced from Ref. [57] with permission of Wiley
    Simulation results. (a) Electric field profiles in tunneling regions for devices A4, A5, and A6 at injection current of 35 mA; (b) hole concentration profiles in active region for devices A3, A4, A5, and A6 at current injection of 35 mA; (c) light output power for devices A3, A4, A5, and A6 versus injection current
    Lateral hole concentration profiles in last quantum well for devices A3, A4, A5, and A6 at injection current of 35 mA
    Current versus applied voltage for devices A3, A4, A5, and A6
    Energy band diagram and electric field profile in interface depletion region of p-AlxGa1-xN layer. (a) Energy band diagram; (b) schematic of electric field profile. Reproduced from Ref. [58] with permission of Optical Society of America
    Simulation results. (a) Electric field profiles in hole supplier layer for five groups of DUV LED devices; (b) calculated power densities for five groups of DUV LED devices at injection current of 200 A·cm-2. (a) is reproduced from Ref. [58] with permission of Optical Society of America. (b) is reproduced from Ref. [4], and the value is summarized according to the report in Ref. [58]
    I-V characteristic comparison. (a) Original device and Reference device; (b) Reference device and device B1; (c) Reference device, device B2 and device B3. Reproduced from Ref. [58] with permission of Optical Society of America
    Schematic and simulation results. Schematic of energy bands for (a) DUV LED with the conventional p-EBL and (b) DUV LED with the p-AlxGa1-xN/AlyGa1-yN/AlxGa1-xN (x>y) EBL; (c) hole concentration profiles in p-EBL and p-AlGaN layers. Reproduced from Ref. [59] with permission of American Chemical Society
    Simulation and experimental results. (a) Hole concentration profiles in quantum wells for devices C1 and C2; (b) measured optical power and EQE for devices C1 and C2; (c) calculated optical power and EQE for devices C1 and C2. Reproduced from Ref. [59] with permission of American Chemical Society
    Simulation results at injection current of 35 mA. (a) Light output power for DUV LEDs in terms of the polarization level; (b) hole concentration profiles in quantum wells, p-AlGaN layer and p-GaN layer for devices D1, D2, D3, D4, and D5. Reproduced from Ref. [79] with permission of Elsevier
    Simulation results at injection current of 35 mA. (a) Light output power for DUV LED versus polarization level at p-EBL/p-AlGaN/p-GaN interface; (b) hole concentration profiles in quantum well, p-AlGaN layer and p-GaN layer for devices D6, D7, D8, and D9; (c) electric field profiles for devices D6, D7, D8, and D9. Reproduced from Ref. [79] with permission of Elsevier
    Carrier concentration profiles for devices E1, E2, and E3 at injection current of 100 A/cm2. (a) Electron profiles; (b) hole profiles. Reproduced from Ref. [83] with permission of Optical Society of America
    Energy band diagram and optical output power. (a) Schematic of energy bands for UVA LED; (b) measured (curve) and calculated (scatterplot) optical powers for devices E1,E2, and E3 in terms of current. Reproduced from Ref. [84] with permission of Optical Society of America
    • Table 1. Devices with different AlN compositions for p-EBL and the p-AlxGa1-xN layers. Reproduced from Ref. [58] with permission of Optical Society of America

      View table

      Table 1. Devices with different AlN compositions for p-EBL and the p-AlxGa1-xN layers. Reproduced from Ref. [58] with permission of Optical Society of America

      Devicep-AlxGa1-xN (50 nm)Φh /meVp-EBL (10 nm)Work /meV
      Original devicep-GaN0p-Al0.68Ga0.32N EBL-277.50
      Reference devicep-Al0.49Ga0.51N583.00p-Al0.68Ga0.32N EBL-7454.70
      Device B1p-Al0.49Ga0.51N460.00p-Al0.60Ga0.40N EBL-5456.10
      Device B2p-Al0.40Ga0.60N322.00p-Al0.68Ga0.32N EBL-381.97
      Device B3p-Al0.30Ga0.70N238.00p-Al0.68Ga0.32N EBL-365.72
    • Table 2. Work done to holes by electric field within p-AlGaN/p-GaN structure for devices D6, D7, D8, and D9 at injection current of 35 mA. Reproduced from Ref. [79] with permission of Elsevier

      View table

      Table 2. Work done to holes by electric field within p-AlGaN/p-GaN structure for devices D6, D7, D8, and D9 at injection current of 35 mA. Reproduced from Ref. [79] with permission of Elsevier

      DevicesD6D7D8D9
      Work /meV+236-323-526-652
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    Kangkai Tian, Chunshuang Chu, Wengang Bi, Yonghui Zhang, Zihui Zhang. Hole Injection Efficiency Improvement for AlGaN-Based Deep Ultraviolet Light-Emitting Diodes[J]. Laser & Optoelectronics Progress, 2019, 56(6): 060001

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    Paper Information

    Category: Reviews

    Received: Sep. 11, 2018

    Accepted: Nov. 13, 2018

    Published Online: Jul. 30, 2019

    The Author Email: Zhang Yonghui (zhangyh@hebut.edu.cn), Zhang Zihui (zh.zhang@hebut.edu.cn)

    DOI:10.3788/LOP56.060001

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