Physical and Chemical Behavior of Aluminum Alloy Oxide Film Removal Under the Action of Pulsed Laser

Jin Wentao; Zhang Hongkui; Wang Qiang; Cao Xinghua; Liu Zehui; Wang Chunming; Lei Wenbo

doi:10.14128/j.cnki.al.20254503.094

APPLIED LASER, Volume. 45, Issue 3, 94(2025)

Physical and Chemical Behavior of Aluminum Alloy Oxide Film Removal Under the Action of Pulsed Laser

Jin Wentao¹, Zhang Hongkui¹, Wang Qiang¹, Cao Xinghua¹, Liu Zehui^2、*, Wang Chunming², and Lei Wenbo²

Author Affiliations

¹CRRC Nanjing Puzhen Vehicle Co., Ltd., Nanjing 210031, Jiangsu, China

²School of Material Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, Hubei, China

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Jin Wentao, Zhang Hongkui, Wang Qiang, Cao Xinghua, Liu Zehui, Wang Chunming, Lei Wenbo. Physical and Chemical Behavior of Aluminum Alloy Oxide Film Removal Under the Action of Pulsed Laser[J]. APPLIED LASER, 2025, 45(3): 94

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Paper Information

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Received: Apr. 4, 2023

Accepted: Jun. 17, 2025

Published Online: Jun. 17, 2025

The Author Email: Liu Zehui (lzh912430891@163.com)

DOI:10.14128/j.cnki.al.20254503.094

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology