Research Progress of High‐Resolution Direct Laser Writing Lithography Based on Phase Change Thin Film (Invited)

Jialong Guo; Tao Wei; Jingsong Wei; Jing Hu; Miao Cheng; Qianqian Liu; Ruirui Wang; Wanfei Li; Bo Liu

doi:10.3788/CJL240577

Chinese Journal of Lasers, Volume. 51, Issue 12, 1202410(2024)

Research Progress of High‐Resolution Direct Laser Writing Lithography Based on Phase Change Thin Film (Invited)

Jialong Guo¹, Tao Wei^1、*, Jingsong Wei^2、**, Jing Hu¹, Miao Cheng¹, Qianqian Liu¹, Ruirui Wang¹, Wanfei Li¹, and Bo Liu^1、***

Author Affiliations

¹Suzhou Key Laboratory for Nanophotonic and Nanoelectronic Materials and Its Devices, School of Materials Science and Engineering, Suzhou University of Science and Technology, Suzhou 215009, Jiangsu , China

²Laboratory of Micro-Nano Optoelectronic Materials and Devices, Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences, Shanghai 201800, China

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Jialong Guo, Tao Wei, Jingsong Wei, Jing Hu, Miao Cheng, Qianqian Liu, Ruirui Wang, Wanfei Li, Bo Liu. Research Progress of High‐Resolution Direct Laser Writing Lithography Based on Phase Change Thin Film (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202410

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Paper Information

Category: Laser Micro-Nano Manufacturing

Received: Feb. 5, 2024

Accepted: Mar. 25, 2024

Published Online: May. 29, 2024

The Author Email: Tao Wei (weitao@usts.edu.cn), Jingsong Wei (weijingsong@siom.ac.cn), Bo Liu (liubo@mails.usts.edu.cn)

DOI:10.3788/CJL240577

CSTR:32183.14.CJL240577

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology