Chinese Optics Letters, Volume. 8, Issue s1, 216(2010)

Patterning process of SiO2 film and fabrication of Si V-groove

Jun’e Liu, Zhongda Guo, Weiguo Liu, and Huan Liu
Author Affiliations
  • Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory, Xi’an Technological University, Xi’an 710032, China
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    References(5)

    [1] [1] Y. Liu, C. Chen, G. Ding, and Y. Cui, J. Tianjin Univ. (in Chinese) 36, 409 (2003).

    [2] [2] Y. Lei, Infrared and Laser Engineering (in Chinese) 31, 447 (2002).

    [3] [3] C. Cai, R. Ma, W. Liu, H. Liu, and S. Zhou, Semicond. Optoelectron. (in Chinese) 30, 211 (2009).

    [4] [4] G. Shen, C. Wu, P. Yao, X. Yang, X. Liu, P. Lu, and S. Gao, Chinese J. Sensors and Actuators (in Chinese)(2) 140 (2001).

    [5] [5] C. Yang, Semicond. Optoelectron. (in Chinese) 21, 73 (2000).

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    Jun’e Liu, Zhongda Guo, Weiguo Liu, Huan Liu, "Patterning process of SiO2 film and fabrication of Si V-groove," Chin. Opt. Lett. 8, 216 (2010)

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    Paper Information

    Received: Dec. 2, 2009

    Accepted: --

    Published Online: May. 14, 2010

    The Author Email:

    DOI:10.3788/COL201008s1.0216

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