Chinese Optics Letters, Volume. 8, Issue s1, 78(2010)

Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation

Hua Shen1, Rihong Zhu1, Qing Wang1, and Linhua Xu2
Author Affiliations
  • 1School of Electronic Engineering and Photo-electric Technology, Nanjing University of Science and Technology, Nanjing 210094, China
  • 2School of Science, Nanjing University of Science and Technology, Nanjing 210094, China
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    CLP Journals

    [1] Youhua Jia, Biao Zhong, Jianping Yin, "Mechanism of refrigeration cycle on laser cooling of solids," Chin. Opt. Lett. 10, 031401 (2012)

    [2] Xu Xingchen, Zhou Yaxun, Dai Shixun, Wang Xunsi, Zheng Shichao, Yin Dandan. Mid-Infrared Luminescence and Energy Transfer Mechanism of Tm3+/Ho3+ Co-Doped Tellurite Glasses[J]. Chinese Journal of Lasers, 2012, 39(10): 1006002

    [3] Xu Xingchen, Zhou Yaxun, Dai Shixun, Wang Xunsi, Zheng Shichao, Yin Dandan. Mid-Infrared Luminescence and Energy Transfer Mechanism of Tm3+/Ho3+ Co-Doped Tellurite Glasses[J]. Chinese Journal of Lasers, 2012, 39(10): 1006002

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    Hua Shen, Rihong Zhu, Qing Wang, Linhua Xu, "Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation," Chin. Opt. Lett. 8, 78 (2010)

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    Paper Information

    Received: Nov. 25, 2009

    Accepted: --

    Published Online: May. 14, 2010

    The Author Email:

    DOI:10.3788/COL201008s1.0078

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