Chinese Optics Letters, Volume. 8, Issue s1, 78(2010)
Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation
[1] [1] D. Ma, S. Ma, K. Xu, and S. Veprek, Acta Metall. Sin. (in Chinese) 40, 1037 (2004).
[2] [2] Y. Zhang, Y. Wu, D. Ba, and S. Ma, J. Iron Steel Res. (in Chinese) 19, 50 (2007).
[3] [3] X. Zhang, B. Ye, S. Dai, Z. du, and P. Zhang, Lubric. Eng. (in Chinese) 179, 82 (2006).
[4] [4] Y. Chen and W. Liu, Tribology (in Chinese) 21, 274 (2001).
[5] [5] Y. Wang and F. Yan, J. Mater. Sci. Eng. (in Chinese) 23, 879 (2005).
[6] [6] W. Wang, P. Sun, and G. Dai, Chinese J. Rare Metals (in Chinese) 25, 78 (2001).
[7] [7] Y. Xu, L. Zhang, D. Wu, Y. Sun, Z. Huang, X. Jiang, X. Wei, Z. Li, B. Dong, and Z. Wu, J. Opt. Soc. Am. B 22, 1899 (2005).
[8] [8] Y. Taga and T. Itoh, Appl. Opt. 28, 2690 (1989).
[9] [9] T. Wang, J. Gao, X. Wang, Q. Song, H. Chen, X. Chen, Z. Shen, Z. Shan, and W. Ling, Opt. Instrum. (in Chinese) 28, 79 (2006).
[10] [10] T. Yanagisawa, A. Nakajima, M. Sakai, Y. Kameshima, and K. Okada, Mater. Sci. Eng. B 161, 36 (2009).
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Hua Shen, Rihong Zhu, Qing Wang, Linhua Xu, "Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation," Chin. Opt. Lett. 8, 78 (2010)
Received: Nov. 25, 2009
Accepted: --
Published Online: May. 14, 2010
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