Density and refractive index of thin evaporated films

[6] [6] H. Ahrens, “Bestimmung der Absorptionsindices und der Struktur dielektrischer Aufdampfschichten in Abh¨angigkeit von den Herstellungsparametern”, PhD. Thesis (Technische Universit¨at Hannover, 1974).

[7] [7] B. Klein, “Hard-and Software for Optical Spectroscopy”, http://www.mtheiss.com (February 17, 1998).

[8] [8] D. Mergel and Z. Qiao, J. Phys. D: Appl. Phys. 35, 794 (2002).

[9] [9] Z. Qiao, C. Agashe, and D. Mergel, Thin Solid Films 496, 520 (2006).

[10] [10] P. W. Atkins, The Elements of Physical Chemistry (Oxford University Press, Oxford, 1975).

[11] [11] C. R. Ottermann and K. Bange, Thin Solid Films 286, 32 (1996).

[12] [12] H. K. Pulker, G. Paesold, and E. Ritter, Appl. Opt. 15, 2986 (1976).

[13] [13] E. E. Khawaja, F. Bouamrane, F. Al-Adel, A. B. Hallak, M. A. Daous, and M. A. Salim, Thin Solid Films 240, 121 (1994).

[14] [14] M. Laube, R. Rauch, C. Ottermann, O. Anderson, and K. Bange, Nucl. Instrum. Meth. Phys. Res. B 113, 288 (1996).

[15] [15] J. M. Bennett, E. Pelletier, G. Albrand, J. P. Borgogno, B. Lazarides, C. K. Carniglia, R. A. Schmell, T. H. Allen, T. Tuttle-Hart, K. H. Guenther, and A. Saxer, Appl. Opt. 28, 3303 (1989).

[16] [16] C. Yang, H. Fan, Y. Xi, J. Chen, and Z. Li, Appl. Surf. Sci. 254, 2685 (2008).

[17] [17] D. E. Aspnes, Am. J. Phys. 50, 704 (1982).

[18] [18] D. E. Aspnes, Thin Solid Films 89, 249 (1982).

[19] [19] J. Arndt and W. Hummel, Phys. Chem. Minerals 15, 363 (1988).

[20] [20] N. Kitamura, K. Fukumi, J. Nishii, and N. Ohno, J. Appl. Phys. 101, 123533 (2007).

[21] [21] F. J. Ferrer, F. Yubero, J. A. Mejia, F. J.- Garc a-Lopez, and A. R. Gonzalez-Elipe, J. Appl. Phys. 102, 084112 (2007).

[22] [22] G. He, L. D. Zhang, G. H. Li, M. Liu, and X. J. Wang, J. Phys. D: Appl. Phys. 41, 045304 (2008).

[23] [23] D. A. G. Bruggeman, Ann. Phys. 24, 636 (1935); D. E. Aspnes, Am. J. Phys. 50, 704 (1982).

[24] [24] A. Borras, A. Yanguas-gil, A. Barrance, J. cotino, and A. r. Gonz′alez-Elipe, Phys. Rev. B 76, 235303 (2007).

[25] [25] D. Mergel, Thin Solid Films 397, 216 (2001).

[26] [26] W. Fawcett, Proc. Phys. Soc. 82, 33 (1963).

[27] [27] V. V. Hoang, Phys. Status Solidi B 244, 1280 (2007).

[28] [28] V. V. Hoang, H. Zung, and N. H. B. Trong, Eur. Phys. J. D 44, 515 (2007).

[29] [29] A. B. Murphy, P. R. F. Barnes, L. K. Randeniya, I. C. Plumb, I. E. Grey, M. D. Horne, and J. A. Glasscock, Int. J. Hydrogen Energ. 31, 1999 (2006).

[30] [30] J.-K. Yao, H.-Y. Li, Z.-X. Fan, Y.-X. Tang, Y.-X. Jin, Y.-A. Zhao, H.-b. He, and J.-D. Shao, Chin. Phys. Lett. 24, 1964 (2007).

[31] [31] J. Yao, C. Xu, J. Ma, M. Fang, Z. Fan, Y. Jin, Yuanan Zhao, H. He, and J. Shao, Appl. Surf. Sci. 255, 4733 (2009).

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