Fig. 1. Fabrication process of AWG chip

Fig. 2. Morphology photos of rectangular waveguide. (a) Optical microscope photograph; (b) SEM image

Fig. 3. Relation between film properties and gas flow. (a) Refractive index of film and deposition rate versus gas flow of B₂H₆/PH₃; (b) relation between film stress and gas flow of B₂H₆/PH₃

Fig. 4. Diagram of testing system of chip

Fig. 5. Relation between polarization characteristics of chip and gas flow. (a) PDL and transmission spectrum versus gas flow; (b) output spectra of AWG with high doped cladding

Fig. 6. Relation between PDW of chip and gas flow of B₂H₆/PH₃

Fig. 7. Relation between adjacent channel crosstalk and gas flow of B₂H₆/PH₃

Fig. 8. Relation between PDL of chip and over etching depth