Optical Instruments, Volume. 45, Issue 1, 80(2023)

Fabrication of semiconductor field effect transistor based on a flexible stencil

Yaru JIN and Jiaxin YU*
Author Affiliations
  • School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
  • show less
    Figures & Tables(8)
    Geometric structure of stencil
    Schematic diagram of process flow of the device fabrication
    Schematic of CdSe nanobelts backgate field effect transistor
    Optical micrographs of channels with different sized stencil
    Optical micrographs of rigid shadow masked channels before and after metal deposition
    Optical micrographs of stenciled channels before and after treatment and CdSe nanobelts and PL spectra of CdSe nanobelts
    I-V characteristic curve of CdSe nanobelts backgate FET
    • Table 1. Parameters of the electrode pattern

      View table
      View in Article

      Table 1. Parameters of the electrode pattern

      图案位置d1/μm d2/μm d3/μm d4/μm r/μm
      ROW140200800400150
      ROW240200800400150
      ROW350200800400150
      ROW450200800400150
    Tools

    Get Citation

    Copy Citation Text

    Yaru JIN, Jiaxin YU. Fabrication of semiconductor field effect transistor based on a flexible stencil[J]. Optical Instruments, 2023, 45(1): 80

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: TECHNOLOGY

    Received: Mar. 18, 2022

    Accepted: --

    Published Online: Mar. 20, 2023

    The Author Email: Jiaxin YU (yujiaxin@usst.edu.cn)

    DOI:10.3969/j.issn.1005-5630.2023.001.012

    Topics