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Acta Optica Sinica, Volume. 39, Issue 1, 0126019(2019)

Surface Characteristics of CaF2 Crystal Ablated by Femtosecond Laser

Taiyong Guo1、*, Limu Zhang1, Yingying Ren1、*, Yangjian Cai1、*, Romero Carolina2, and R. Vazquez de Aldana Javier2
Author Affiliations
  • 1 Center of Light Manipulations and Applications, Shandong Provincial Key Laboratory of Optics and Photonic Device, School of Physics and Electronics, Shandong Normal University, Jinan, Shandong 250014, China
  • 2 Laser Microprocessing Group, Department of Applied Physics, University of Salamanca, Salamanca 37008, Spain
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    (a) Optical microscope schematic of the ablation areas on Nd∶CaF2 surface; (b) a set of ablation holes and ablation lines at energy of 2.4 μJ

    Fig. 1. (a) Optical microscope schematic of the ablation areas on Nd∶CaF2 surface; (b) a set of ablation holes and ablation lines at energy of 2.4 μJ

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    SEM images of ablation holes on CaF2 crystal surface with different parameters. (a) A=0.4 μJ, N=10; (b) A=0.6 μJ, N=20; (c) A=4 μJ, N=100; (d) A=4 μJ, N=1000

    Fig. 2. SEM images of ablation holes on CaF2 crystal surface with different parameters. (a) A=0.4 μJ, N=10; (b) A=0.6 μJ, N=20; (c) A=4 μJ, N=100; (d) A=4 μJ, N=1000

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    Parameters of CaF2 crystal in stationary focusing case. (a) Squared diameter D2 of the ablation holes versus the pulse energy Ep; (b) energy flux density threshold versus laser pulse number; (c) energy flux density versus the diameters of ablation holes

    Fig. 3. Parameters of CaF2 crystal in stationary focusing case. (a) Squared diameter D2 of the ablation holes versus the pulse energy Ep; (b) energy flux density threshold versus laser pulse number; (c) energy flux density versus the diameters of ablation holes

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    SEM images of ablation lines on CaF2 crystal surface with different parameters. (a)(d) A=0.8 μJ, v=60 μm/s; (b)(e) A=1.6 μJ, v=5 μm/s; (c)(f) A=2.4 μJ, v=5 μm/s

    Fig. 4. SEM images of ablation lines on CaF2 crystal surface with different parameters. (a)(d) A=0.8 μJ, v=60 μm/s; (b)(e) A=1.6 μJ, v=5 μm/s; (c)(f) A=2.4 μJ, v=5 μm/s

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    Widths of ablation lines as a function of scanning speed. (a) E⊥S; (b) E//S

    Fig. 5. Widths of ablation lines as a function of scanning speed. (a) E⊥S; (b) E//S

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    Parameters of CaF2 crystal in dynamic scanning case.(a)(b) Energy flux density threshold versus effective laser pulse number; (c)(d) widths of the ablation lines versus energy flux density

    Fig. 6. Parameters of CaF2 crystal in dynamic scanning case.(a)(b) Energy flux density threshold versus effective laser pulse number; (c)(d) widths of the ablation lines versus energy flux density

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    • Table 1. Processing parameters for stationary focusing case and dynamic scanning case

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      Table 1. Processing parameters for stationary focusing case and dynamic scanning case

      Number of groupsSet 1Set 2Set 3Set 4Set 5Set 6Set 7Set 8
      Measured energy Em /μJ351015204060100
      Energy on sample Ep /μJ0.110.20.40.60.81.62.44

    • Table 2. Calculated results of effective radius, threshold of energy and energy flux density of ablation holes on the crystal surface obtained under different pulse numbers

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      Table 2. Calculated results of effective radius, threshold of energy and energy flux density of ablation holes on the crystal surface obtained under different pulse numbers

      Pulse number5102050100100010000
      ω /μm2.7602.9082.9943.0303.0743.1173.142
      Eth /μJ0.4110.4060.4050.4010.3970.3860.378
      Fth /(J·cm-2)3.4323.0612.8762.7752.6752.5292.438
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    Taiyong Guo, Limu Zhang, Yingying Ren, Yangjian Cai, Romero Carolina, R. Vazquez de Aldana Javier. Surface Characteristics of CaF2 Crystal Ablated by Femtosecond Laser[J]. Acta Optica Sinica, 2019, 39(1): 0126019

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    Paper Information

    Category: Physical Optics

    Received: Aug. 30, 2018

    Accepted: Oct. 18, 2018

    Published Online: May. 10, 2019

    The Author Email:

    DOI:10.3788/AOS201939.0126019

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology