Fig. 1. Schematic of binary grating mediated by solitons for light modulation. (a) Fabrication process of the NLCs sample. Blue arrows represent the linear polarization of UV light. Yellow and light blue short rods depict the SD1 orientation. Green rods denote the optical axis direction of NLCs. (b) Schematic of photoalignment based on a DMD. (c) Distribution of optical axis at U=0V; laser passes through the sample without diffraction. (d) Distribution of optical axis at U=Upattern; diffraction occurs after laser passes through the sample.

Fig. 2. Localization of solitons within pattern. (a) Mask for single illumination (λ=365nm) to prepare square pattern. (b) Polarized optical micrographs of samples with or without compensator (λ=530nm). Schematic of photoalignment based on a DMD. (c) Polarized optical micrographs of sample when voltage increases from 52.6 to 56.6 V at 500 Hz. (d) Electric conditions corresponding to the states of soliton generation and soliton filling up. (e) Generation of soliton from irregularity. (f) Structure of single soliton. (g) Solitons disappear at the boundary between two domains exposed by light with different wavelengths. Light blue dashed line in (g) indicates the boundary. (h) Comparison on dependence of transmission intensity within soliton and background on time.

Fig. 3. One-dimensional orientational order system. (a), (d) Masks for single illumination (λ=365nm) to prepare patterns. (b), (e) Optical micrographs of samples under crossed polarizers. Anchoring energy within the rectangle is weaker compared to the surroundings. (c), (f) To distinguish boundaries between patterns more clearly, rotate the analyzer counterclockwise by 20° or −20°.

Fig. 4. Optical diffraction for binary gratings mediated by solitons. (a) Uniform state without diffraction. (b), (c) Solitons nucleate from patterns but do not fill patterns. (d) Binary grating with six periods. (e) Binary grating with ten periods. (f) Chaotic phase and corresponding diffraction pattern.

Fig. 5. Two-dimensional binary grating mediated by solitons. (a) Masks for single illumination (λ=365nm) to prepare two-dimensional patterns. (b) Optical micrographs of grating under crossed polarizers. (c) To distinguish boundaries between patterns more clearly, rotate the analyzer counterclockwise by 20° or −20°. (d) Solitons nucleate from patterns but do not fill patterns. (e) Two-dimensional grating. f=500Hz.