Acta Optica Sinica, Volume. 19, Issue 2, 235(1999)
Antireflection Coatings of 1310 nm Opto-Electronic Devices with R<10-4
References(3)
[1] [1] Steven Dzioba, R. Rousina. Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics. J. Vac. Sci. Technol., 1994, B12(1):433～440
[2] [2] Y. Manabe, T. Mitsuyu. Silicon nitride thin films prepared by the electron cyclotron resonance plasma chemical vapor deposition method. J. Appl. Phy., 1989, 66(4):2475～2480
[3] [3] Takashi Inukai. Optical characteristics of amorphous silicon nitride thin films prepared by electron cyclotron resonance plasma chemical vapor deposition. Jpn. J. Appl. Phy., 1994, 33(5A):2593～2598
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[in Chinese], [in Chinese], [in Chinese]. Antireflection Coatings of 1310 nm Opto-Electronic Devices with R<10-4[J]. Acta Optica Sinica, 1999, 19(2): 235
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