[1] TSUTSUMI K, MATSUO R, NAGANO M[J]. Composite ceramic body, and component member for semiconductor manufacturing apparatus: US13864967.

[2] AKINOGLU E M, MORFA A J, GIERSIG M. Understanding anisotropic plasma etching of two-dimensional polystyrene opals for advanced materials fabrication[J]. Langmuir(2014).

[3] XIAO H. Introduction to semiconductor manufacturing technology[M](2012).

[4] EKIELSKI M, WZOREK M, GOLASZEWSKA K et al. Implementation of the inductively coupled plasma etching processes for forming gallium nitride nanorods used in ultraviolet light-emitting diode technology[J]. Journal of Vacuum Science & Technology B(2020).

[5] ITO N, MORIYA T, UESUGI F et al. Reduction of particle contamination in plasma-etching equipment by dehydration of chamber wall[J]. Japanese Journal of Applied Physics(2008).

[6] CUNGR G, PELISSIER B, JOUBERT O et al. New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes[J]. Plasma Sources Science & Technology(2005).

[7] MIN J H, LEE J, AYMAN M T et al. Plasma etching properties of various transparent ceramics[J]. Ceramics International(2020).

[8] DING R H[D]. Anisotropic fluorocarbon plasma etching of silicon/silicon germanide heterostructures and plasma etching-induced sidewall damage(2008).

[9] KIM K, EFREMOV A, LEE J et al. Etching mechanisms of (In, Ga, Zn)O thin films in CF₄/Ar/O₂ inductively coupled plasma[J]. Journal of Vacuum Science & Technology(2015).

[10] FUKUMOTO H, FUJIKAKE I, TAKAO Y et al. Plasma chemical behaviour of reactants and reaction products during inductively coupled CF₄ plasma etching of SiO₂[J]. Plasma Sources Science & Technology(2009).

[11] TING Y H, LIU C C, PARK S M et al. Surface roughening of polystyrene and poly(methyl methacrylate) in Ar/O₂ plasma etching[J]. Polymers(2010).

[12] STEGLICH M, KAESEBIER T, ZILK M et al. The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching[J]. Journal of Applied Physics(2014).

[13] TAN Y C, CHEN P, ZHU Z X et al. Plasma etching behavior of yttrium-aluminum oxide composite ceramics[J]. International Journal of Applied Ceramic Technology(2021).

[14] KIM C S, KIM M J, CHO H et al. Fabrication and plasma resistance of Y₂O₃ ceramics[J]. Ceramics International(2015).

[15] CHITTOCK N J, VOS M F J, FARAZ T et al. Isotropic plasma atomic layer etching of Al₂O₃ using a fluorine containing plasma and Al(CH₃)₃[J]. Applied Physics Letters(2020).

[16] YONEOKA T, TEERAI T, TAKAHASHI Y. High temperature liquid metal corrosion and high temperature electrical conductivity of Y₂O₃[J]. Journal of Nuclear Materials(1997).

[17] IWASAWA J, NISHIMIZU R, TOKITA M et al. Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process[J]. Journal of the American Ceramic Society(2007).

[18] TAN Y C, WANG Y, WU S et al. Sputtering resistance and damage mechanism of Y₂O₃-based ceramics etching by Xe plasma[J]. Materials Today Communications(2021).

[19] KIM D M, LEE S H, ALEXANDER W B et al. X-ray photoelectron spectroscopy study on the interaction of yttrium-aluminum oxide with fluorine-based plasma[J]. Journal of the American Ceramic Society(2011).

[20] KITAMURA J, IBE H, YUASA F et al. Plasma sprayed coatings of high-purity ceramics for semiconductor and flat-panel-display production equipment[J]. Journal of Thermal Spray Technology(2008).

[21] KIM D M, JANG M R, OH Y S et al. Relative sputtering rates of oxides and fluorides of aluminum and yttrium[J]. Surface & Coatings Technology(2017).

[22] CAO Y C, ZHAO L, LUO J et al. Plasma etching behavior of Y₂O₃ ceramics: comparative study with Al₂O₃[J]. Applied Surface Science(2016).

[23] SONG J B, CHOI E, OH S G et al. Improved reliability of breakdown voltage measurement of yttrium oxide coatings by plasma spray[J]. Ceramics International, 22169(2019).

[24] KOTLAN J, SESHADRI R C, SAMPATH S et al. On the dielectric strengths of atmospheric plasma sprayed Al₂O₃, Y₂O₃, ZrO₂-7% Y₂O₃ and (Ba,Sr)TiO₃ coatings[J]. Ceramics International(2015).

[25] LEE J, LEE S, HAN H N et al. Yttrium oxyfluoride coatings deposited by suspension plasma spraying using coaxial feeding[J]. Coatings(2020).

[26] KITAMURA J, TANG Z L, MIZUNO H et al. Structural, mechanical and erosion properties of yttrium oxide coatings by axial suspension plasma spraying for electronics applications[J]. Journal of Thermal Spray Technology(2011).

[27] SHIVARAMU N J, LAKSHMINARASAPPA B N, NAGABHU-SHANA K R et al. Ion beam induced cubic to monoclinic phase transformation of nanocrystalline yttria[J]. Nuclear Instruments & Methods in Physics Research Section B(2016).

[28] BOULOS M I. Thermal plasma processing[J]. IEEE Transactions on Plasma Science(1991).

[29] LI G R, LV B W, YANG G J et al. Relationship between lamellar structure and elastic modulus of thermally sprayed thermal barrier coatings with intra-splat cracks[J]. Journal of Thermal Spray Technology(2015).

[30] ZHANG H, ZENG J, YUAN J et al. Spray power-governed microstructure and composition, and their effects on properties of lanthanum-cerium-tantalum-oxide thermal barrier coating[J]. Ceramics International(2020).

[31] PAKSERESHT A H, GHASALI E, NEJATI M et al. Development empirical-intelligent relationship between plasma spray parameters and coating performance of yttria-stabilized zirconia[J]. International Journal of Advanced Manufacturing Technology(2015).

[32] SHAFIQ M, HUSSAIN G A, KÜTT L et al. Electromagnetic sensing for predictive diagnostics of electrical insulation defects in MV power lines[J]. Measurement(2015).

[33] PAWLOWSKI L. The relationship between structure and dielectric properties in plasma-sprayed alumina coatings[J]. Surface & Coatings Technology(1988).

[34] TOMA F L, SCHEITZ S, BERGER L M et al. Comparative study of the electrical properties and characteristics of thermally sprayed alumina and spinel coatings[J]. Journal of Thermal Spray Technology(2011).

[35] WANG J, HOU J Z. Study on microstructure and interface properties of high dielectric Y₂O₃ thin films[J]. Silicate Bulletin(2010).

[36] TAN Y C[J]. Preparation and properties of plasma etched yttrium matrix composite ceramic(2021).

[37] JUN P S, HYUNGSUN K, MIN L S. Solid-state synthesis of yttirum oxyfluoride powders and their application to suspension plasma spray coating[J]. Korean Journal of Materials Research(2017).

[38] KIM D M, OH Y S, KIM S et al. The erosion behaviors of Y₂O₃ and YF₃ coatings under fluorocarbon plasma[J]. Thin Solid Films(2011).

[39] KWON H, KIM Y, PARK H et al. The importance of intimate inter-crystallite bonding for the plasma erosion resistance of vacuum kinetic sprayed Y₂O₃ coating[J]. Surface & Coatings Technology(2019).

[40] KITAMURA J, MIZUNO H, KATO N et al. Plasma-erosion properties of ceramic coating prepared by plasma spraying[J]. Materials Transactions(2006).