The formation of silicon film deposited by pulsed Nd:YAG laser on glass and NaCl substracte is reported. The film thickness was about 200nm. The deposited silicon film was irradiated by pulsed ultraviolet laser. Formation and microstructure of the film were studied by infrared spectroscopy, X-ray diffraction diagram and electron microscopy. The formation stage of the deposited film was studied with a scanning electron microscope.