Researching | Spatial ionizing radiation effects on VOx uncooled infrared focal plane arrays

NUCLEAR TECHNIQUES, Volume. 48, Issue 5, 050203(2025)

Spatial ionizing radiation effects on VO_x uncooled infrared focal plane arrays

Hong YIN, Xuan WEN, Zhanzu FENG, Jun WANG, Chengxuan ZHAO, Xin GAO, Xiaogang QIN, Liang SHI, Jianfeng ZHANG, and Shengsheng YANG^*

Author Affiliations

Lanzhou Institute of Physics Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou 730000, China

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References(18)

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[3] WANG Hongchen. Study on vanadium oxide thin film and uncooled infrared detector array[D](2006).

[4] QIU Yiwu, GUO Fengqi, YIN Yanan et al. Total ionizing dose effect of enhanced AlGaN/GaN HEMT devices under different bias[J]. Nuclear Techniques, 46, 110502(2023).

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[6] CHANG Siyuan, YANG Shengsheng, WEN Xuan et al. Experimental study on the total ionizing dose effects of nonvolatile RRAM[J]. Nuclear Techniques, 43, 120502(2020).

[7] ZHENG Hongchao, WANG Liang, LI Zhe et al. Development and application of a radiation effect evaluation method of aerospace integrated circuits for radiation hardened by design[J]. Nuclear Techniques, 46, 080007(2023).

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[9] Mabakachaba B M, Madiba I G, Khanyile B S et al. Structural and morphological studies of proton irradiated vanadium dioxide thin films[J]. Materials Today: Proceedings, 53, 399-403(2022).

[10] Gupta K, Kumar S, Singhal R. Effect of annealing and swift heavy ions irradiation on vanadium oxide thin films[J]. Radiation Effects and Defects in Solids, 176, 673-680(2021).

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[13] Lee J, Kim Y, Jung D G et al. Annealing temperature effect on the temperature coefficient of resistance for vanadium oxide (VOx) thin films as bolometer materials[J]. Japanese Journal of Applied Physics, 62, SG1039(2023).

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Hong YIN, Xuan WEN, Zhanzu FENG, Jun WANG, Chengxuan ZHAO, Xin GAO, Xiaogang QIN, Liang SHI, Jianfeng ZHANG, Shengsheng YANG. Spatial ionizing radiation effects on VO_x uncooled infrared focal plane arrays[J]. NUCLEAR TECHNIQUES, 2025, 48(5): 050203

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Paper Information

Category: ACCELERATOR, RAY TECHNOLOGY AND APPLICATIONS

Received: Jul. 27, 2024

Accepted: --

Published Online: Jun. 26, 2025

The Author Email: Shengsheng YANG (杨生胜)

DOI:10.11889/j.0253-3219.2025.hjs.48.240307

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology