Ultra-Hard Anti-Friction Anti-Reflective Film for Display System

Yonggang Pan; Baoliang Zhao; Xiuhua Fu; Haijun Jin; Yu Geng; Gong Zhang; Haodi Qi

doi:10.3788/AOS241127

Acta Optica Sinica, Volume. 44, Issue 21, 2131001(2024)

Ultra-Hard Anti-Friction Anti-Reflective Film for Display System

Yonggang Pan1...2, Baoliang Zhao1,2,*, Xiuhua Fu1,2, Haijun Jin3, Yu Geng3, Gong Zhang1, and Haodi Qi12 |Show fewer author(s)

Author Affiliations

¹School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin , China

²Zhongshan Research Institute, Changchun University of Science and Technology, Zhongshan 528437, Guangdong , China

³Guangchi Technology (Shanghai) Co., Ltd., Shanghai 200444, China

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Figures & Tables(27)

Fig. 1. Optical constants of Si₃N₄

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$Optical constants of SiON under different O2 gas-filling conditions. (a) Refractive index; (b) extinction coefficient$

Fig. 2. Optical constants of SiON under different O₂ gas-filling conditions. (a) Refractive index; (b) extinction coefficient

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$Optical constants of SiON under different N2 gas-filling conditions. (a) Refractive index; (b) extinction coefficient$

Fig. 3. Optical constants of SiON under different N₂ gas-filling conditions. (a) Refractive index; (b) extinction coefficient

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$Optical constants of SiTiON under different sputtering powers of Ti target conditions. (a) Refractive index; (b) extinction coefficient$

Fig. 4. Optical constants of SiTiON under different sputtering powers of Ti target conditions. (a) Refractive index; (b) extinction coefficient

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Fig. 5. Microscopic image of the surface of film

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Fig. 6. Optical constants of SiTiON

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Fig. 7. SEM image of cross section of slice

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Fig. 8. EDS element imaging results of cross section of slice

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Fig. 9. Theoretical designed spectral curve

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Fig. 10. Design spectrum and test spectrum

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Fig. 11. Hardness test conditions. (a) Curve of applied load with time; (b) curve of pressed depth with time

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Fig. 12. Measurement results of hydrophobic angle. (a) Before friction; (b) after friction

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Fig. 13. Measurement results of hydrophobic angle before and after evaporating AS liquid. (a) Before evaporating; (b) after evaporating

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Fig. 14. Microscopic image of hundred-grid result

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Table 1. Equivalent permittivity and refractive index of SiON film under different O₂ flows
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Table 1. Equivalent permittivity and refractive index of SiON film under different O₂ flows
Flow of O₂ /（mL·min^-1） Flow of N₂ /（mL·min^-1） $f_{S i_{3} N_{4}}$ /% $ε_{S i O N}$ $n_{S i O N}$
0 30 100.0 4.203 2.051
45 30 25.0 2.549 1.596
90 30 14.3 2.364 1.538
135 30 10.0 2.292 1.514
180 30 7.6 2.253 1.501
225 30 6.2 2.231 1.494

Table 2. Equivalent permittivity and refractive index of TiON film under different O₂ flows
View table
Table 2. Equivalent permittivity and refractive index of TiON film under different O₂ flows
Flow of O₂ /（mL·min^-1） Flow of N₂ /（mL·min^-1） $f_{T i N}$ /% $ε_{T i O N}$ $n_{T i O N}$
0 30 100.0 2.624 1.619
45 30 57.1 3.665 1.914
90 30 40.0 4.128 2.031
135 30 30.7 4.213 2.053
180 30 25.0 4.559 2.135
225 30 21.1 4.679 2.163

Table 3. Equivalent permittivity and refractive index of SiON film under different N₂ flows
View table
Table 3. Equivalent permittivity and refractive index of SiON film under different N₂ flows
Flow of O₂ /
（mL·min^-1）
Flow of N₂ /
（mL·min^-1）
$f_{S i_{3} N_{4}}$ /% $ε_{S i O N}$ $n_{S i O N}$
180 20 5.2 2.215 1.488
180 30 7.6 2.253 1.501
180 40 10.0 2.292 1.514
180 50 12.2 2.328 1.526

Table 4. Equivalent permittivity and refractive index of TiON film under different N₂ flows
View table
Table 4. Equivalent permittivity and refractive index of TiON film under different N₂ flows
Flow of O₂ /
（mL·min^-1）
Flow of N₂ /
（mL·min^-1）
$f_{T i N}$ /% $ε_{T i O N}$ $n_{T i O N}$
180 20 18.2 4.763 2.182
180 30 25.0 4.559 2.135
180 40 30.8 4.389 2.095
180 50 35.7 4.249 2.061

Table 5. Deposition process of Si₃N₄ film
View table
Table 5. Deposition process of Si₃N₄ film
Material TG2/3-Si ICP×2
TG power /kW
Flow of Ar /
（mL·min^-1）
ICP power /kW
Flow of Ar /
（mL·min^-1）
Flow of O₂ /
（mL·min^-1）
Flow of N₂ /
（mL·min^-1）
Si₃N₄ 10 50 4 100 - 100

Table 6. Vickers hardness of Si₃N₄ film
View table
Table 6. Vickers hardness of Si₃N₄ film
Material Measuring point Vickers hardness /HV
Si₃N₄ 1 2031.6
2 2006.3
3 2025.7

Table 7. Vickers hardness and stress of SiTiON composite film under different ICP power conditions
View table
Table 7. Vickers hardness and stress of SiTiON composite film under different ICP power conditions
ICP power /kW Vickers hardness /HV Stress /MPa
0 1416.2 -785.6
1 1431.8 -806.3
2 1458.6 -863.5
3 1462.3 -821.9
4 1507.4 -802.4
5 - -1136.8

Table 8. Deposition process of SiTiON film

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Table 8. Deposition process of SiTiON film

Material	TG2-Ti		TG3/4-Si		ICP×2
Material	TG power /kW	Flow of Ar /（mL·min^-1）	TG power /kW	Flow of Ar /（mL·min^-1）	ICP power /kW	Flow of Ar /（mL·min^-1）	Flow of O₂ /（mL·min^-1）	Flow of N₂ /（mL·min^-1）
SiTiON	1	50	10	50	4	100	180	30

Table 9. Vickers hardness of SiTiON_film
View table
Table 9. Vickers hardness of SiTiON_film
Material Measuring point Vickers hardness /HV
SiTiON 1 1537.3
2 1503.7
3 1524.2

Table 10. Contents of major and minor elements in SiTiON composite film

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Table 10. Contents of major and minor elements in SiTiON composite film

Element	Line type	Osimentration	K ratio	Mass fraction /%	σ /%	Percentage of elements /%
N	K linear	2.59	0.00461	3.81	0.41	8.47
O	K linear	22.90	0.07705	49.49	0.26	57.21
Si	K linear	19.36	0.15341	42.89	0.23	28.71
Ti	K linear	1.30	0.01304	3.81	0.08	5.61

Table 11. Process parameters of cleaning

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Table 11. Process parameters of cleaning

Clean-up time /s	TG2-Ti		TG3/4-Si		ICP×2
Clean-up time /s	TG power /kW	Flow of Ar /（mL·min^-1）	TG power /kW	Flow of Ar /（mL·min^-1）	ICP power /kW	Flow of Ar /（mL·min^-1）	Flow of O₂ /（mL·min^-1）	Flow of N₂ /（mL·min^-1）
90	-	100	-	100	2	120	-	-

Table 12. Young’s modulus and Vickers hardness of anti-reflection film
View table
Table 12. Young’s modulus and Vickers hardness of anti-reflection film
Measuring point E /GPa Vickers hardness /HV
1 199.3 1802.6
2 198.5 1793.8
3 197.2 1786.2

Table 13. Deposition process of AS liquid
View table
Table 13. Deposition process of AS liquid
Material IBS RH /A Thickness /nm
Beam voltage /V Beam current /mA Accelerating voltage /V Flow of O₂ /（mL·min^-1） Flow of Ar /（mL·min^-1）
SiO₂ 1000 1000 600 50 8 - 5
AS - - - - - 200 10

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Yonggang Pan, Baoliang Zhao, Xiuhua Fu, Haijun Jin, Yu Geng, Gong Zhang, Haodi Qi. Ultra-Hard Anti-Friction Anti-Reflective Film for Display System[J]. Acta Optica Sinica, 2024, 44(21): 2131001

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Paper Information

Category: Thin Films

Received: Jun. 3, 2024

Accepted: Jul. 8, 2024

Published Online: Nov. 20, 2024

The Author Email: Baoliang Zhao (zbljilin22@163.com)

DOI:10.3788/AOS241127

CSTR:32393.14.AOS241127

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Equivalent permittivity and refractive index of SiON film under different O2 flows

Table 1. Equivalent permittivity and refractive index of SiON film under different O2 flows

Table 2. Equivalent permittivity and refractive index of TiON film under different O2 flows

Table 2. Equivalent permittivity and refractive index of TiON film under different O2 flows

Table 3. Equivalent permittivity and refractive index of SiON film under different N2 flows

Table 3. Equivalent permittivity and refractive index of SiON film under different N2 flows

Table 4. Equivalent permittivity and refractive index of TiON film under different N2 flows

Table 4. Equivalent permittivity and refractive index of TiON film under different N2 flows

Table 5. Deposition process of Si3N4 film

Table 5. Deposition process of Si3N4 film

Table 6. Vickers hardness of Si3N4 film

Table 6. Vickers hardness of Si3N4 film

Table 7. Vickers hardness and stress of SiTiON composite film under different ICP power conditions

Table 7. Vickers hardness and stress of SiTiON composite film under different ICP power conditions

Table 8. Deposition process of SiTiON film

Table 8. Deposition process of SiTiON film

Table 9. Vickers hardness of SiTiONfilm

Table 9. Vickers hardness of SiTiONfilm

Table 10. Contents of major and minor elements in SiTiON composite film

Table 10. Contents of major and minor elements in SiTiON composite film

Table 11. Process parameters of cleaning

Table 11. Process parameters of cleaning

Table 12. Young’s modulus and Vickers hardness of anti-reflection film

Table 12. Young’s modulus and Vickers hardness of anti-reflection film

Table 13. Deposition process of AS liquid

Table 13. Deposition process of AS liquid

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Table 1. Equivalent permittivity and refractive index of SiON film under different O₂ flows

Table 1. Equivalent permittivity and refractive index of SiON film under different O₂ flows

Table 2. Equivalent permittivity and refractive index of TiON film under different O₂ flows

Table 2. Equivalent permittivity and refractive index of TiON film under different O₂ flows

Table 3. Equivalent permittivity and refractive index of SiON film under different N₂ flows

Table 3. Equivalent permittivity and refractive index of SiON film under different N₂ flows

Table 4. Equivalent permittivity and refractive index of TiON film under different N₂ flows

Table 4. Equivalent permittivity and refractive index of TiON film under different N₂ flows

Table 5. Deposition process of Si₃N₄ film

Table 5. Deposition process of Si₃N₄ film

Table 6. Vickers hardness of Si₃N₄ film

Table 6. Vickers hardness of Si₃N₄ film

Table 9. Vickers hardness of SiTiON_film

Table 9. Vickers hardness of SiTiON_film