Laser & Optoelectronics Progress, Volume. 58, Issue 14, 1410005(2021)

Exposure Fusion Based on Improved Exposure Evaluation and Double Pyramids

Lingfeng Wu1、**, Junbao Hu2、*, and Chang Yuan3
Author Affiliations
  • 1College of Mechanical and Electrical Engineering, Guangdong University of Science and Technology, Dongguan, Guangdong 523083, China
  • 2Institute of Micro-Nano Optoelectronics, Shenzhen University, Shenzhen, Guangdong 518060, China
  • 3School of Materials Science & Engineering, Beijing Institute of Technology, Beijing 100081, China;
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    Figures & Tables(6)
    EF flow chart of our method
    Fusion results of different methods on the house sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method
    Fusion results of different methods on the garage sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method
    Fusion results of different methods on the memorial sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method
    Fusion results of different methods on the chandelier sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method
    • Table 1. Objective evaluation indicators of different methods

      View table

      Table 1. Objective evaluation indicators of different methods

      SequenceMethodSFIEAGNIQESSEQ
      houseWM0.0447.4290.01423.53133.486
      EE0.0587.3310.03325.12432.325
      LP0.0857.4960.03623.14528.229
      DL0.0507.5860.01622.65230.999
      EEF0.0887.4890.04019.10325.739
      ours0.0977.5910.04221.89825.182
      garageWM0.0687.2670.01924.31227.861
      EE0.1077.1940.03430.62333.325
      LP0.1017.4180.03125.71821.325
      DL0.1097.3820.02828.35430.495
      EEF0.0937.4410.03225.60120.333
      ours0.1087.4560.03520.96820.739
      memorialWM0.0637.2160.02124.78229.673
      EE0.0926.8790.02927.67830.324
      LP0.0987.4270.03620.78322.354
      DL0.0687.2840.02321.38928.493
      EEF0.0957.3490.03322.60420.192
      ours0.1037.5260.03520.02719.334
      chandelierWM0.0257.2670.01524.31329.692
      EE0.0577.3810.01822.67231.324
      LP0.0567.3230.01123.78226.342
      DL0.0227.2540.00526.38228.953
      EEF0.0737.4420.02223.78924.372
      ours0.0787.3430.02921.28121.642
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    Lingfeng Wu, Junbao Hu, Chang Yuan. Exposure Fusion Based on Improved Exposure Evaluation and Double Pyramids[J]. Laser & Optoelectronics Progress, 2021, 58(14): 1410005

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    Paper Information

    Category: Image Processing

    Received: Sep. 14, 2020

    Accepted: Nov. 14, 2020

    Published Online: Jun. 30, 2021

    The Author Email: Lingfeng Wu (lfwu1822@163.com), Junbao Hu (junbaohu@foxmail.com)

    DOI:10.3788/LOP202158.1410005

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