Opto-Electronic Advances, Volume. 4, Issue 10, 200029-1(2021)

Optical properties and applications of SnS2 SAs with different thickness

Mengli Liu, Hongbo Wu, Ximei Liu, Yaorong Wang, Ming Lei, Wenjun Liu*, Wei Guo*, and Zhiyi Wei*
Figures & Tables(9)
Characterization of materials. The AFM image, thickness and nonlinear absorption of (a,d,g)107 nm-SnS2 SA, (b,e,h)7.7 nm-SnS2 SA, (c,f,i)4 nm-SnS2 SA.
The simplified representation of QSFL based on SnS2.
The function of the QSFL based on 107 nm-SnS2 SA. (a) The τ of a single pulse. (b) RF spectrum (illustration: RF spectrum within a bandwidth of 2 MHz). (c) Emission spectrum. (d) The monitoring of Pout within 8 hours. (e) Variation of τ and Frep as functions of Ppump. (f) Variation of Pout and Ep as functions of Ppump.
The performance of the QSFL based on 7.7 nm-SnS2 SA. (a) The τ of a single pulse. (b) The monitoring of Pout within 8 hours. (c) Variation of τ and Frep as functions of Ppump. (d) Variation of Pout and Ep as functions of Ppump.
The performance of the QSFL based on 4 nm-SnS2 SA. (a) The τ of a single pulse. (b) The monitoring of Pout within 8 hours. (c) Variation of τ and Frep as functions of Ppump. (d) Variation of Pout and Ep as functions of Ppump.
The DFT calculated deformation potential limited electron mobility along kx direction of SnS2 vs. the number of SnS2 layers.
  • Table 1. The performance of three different QSFLs adopting distinct SA.

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    Table 1. The performance of three different QSFLs adopting distinct SA.

    SAαs/Isat(MW/cm2) Threshold(mW)τ(μs) Frep (kHz) Stability (mW)Pout(mW) Ep(nJ)
    107 nm-SnS240.5%/0.682120.485−1.4141−2410.49312.752.6
    7.7 nm-SnS236.9%/1.32760.493−0.844162−2400.5214.359
    4 nm-SnS231.5%/0.521800.503−1.25123−2480.54311.345.7
  • Table 2. Comparison of QSFL based on various SAs.

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    Table 2. Comparison of QSFL based on various SAs.

    Materilasαs (%) λ/λ(nm) Frep(kHz) τ(μs) Pout/Ppump(mW) Threshold(mW)Ep(nJ) SNR(dB)Refs.
    Graphene0.02/1539.610.36−41.83.89<1.2/6513.528.730ref.34
    BP18.550.2/1562.876.983−15.7813.2~1.5/1955094.345ref.35
    WS22.53−/156047.03~77.933.966.41/6504001179.454.2ref.36
    MoS22−/1551.28.77−43.473.35.91/22718.916050ref.37
    SnS23.150.03/1532.7172.3−233.00.5109.33/632290~4050ref.30
    SnS240.54.3/1530.6141−2410.48512.7/63018045.750This work
  • Table 3. The intrinsic carrier concentration (kx) of SnS2 vs. the number of SnS2 layers.

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    Table 3. The intrinsic carrier concentration (kx) of SnS2 vs. the number of SnS2 layers.

    ThicknessBand gapnix (m−2)
    1-Layer1.57 eV2.44×10+3
    2-Layer1.52 eV6.74×10+3
    4-Layer1.39 eV1.13×10+5
    6-Layer1.34 eV4.73×10+5
    8-Layer1.27 eV1.79×10+6
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Mengli Liu, Hongbo Wu, Ximei Liu, Yaorong Wang, Ming Lei, Wenjun Liu, Wei Guo, Zhiyi Wei. Optical properties and applications of SnS2 SAs with different thickness[J]. Opto-Electronic Advances, 2021, 4(10): 200029-1

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Paper Information

Category: Original Article

Received: Jul. 10, 2020

Accepted: Sep. 29, 2020

Published Online: Dec. 28, 2021

The Author Email: Wenjun Liu (jungliu@bupt.edu.cn), Wei Guo (weiguo7@bit.edu.cn), Zhiyi Wei (zywei@iphy.ac.cn)

DOI:10.29026/oea.2021.200029

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