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Acta Optica Sinica, Volume. 30, Issue 1, 272(2010)

Influence of Buffer Layer on Performances of 1064 nm,532 nm Frequency-Doubled Antireflection Coating for LiB3O5

Tan Tianya1,2、*, Yu Hanjiang1,2, Wu Wei1,2, Guo Yongxin1,2, Shao Jianda3, and Fan Zhengxiu3
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    Tan Tianya, Yu Hanjiang, Wu Wei, Guo Yongxin, Shao Jianda, Fan Zhengxiu. Influence of Buffer Layer on Performances of 1064 nm,532 nm Frequency-Doubled Antireflection Coating for LiB3O5[J]. Acta Optica Sinica, 2010, 30(1): 272

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    Paper Information

    Category: Thin Films

    Received: Oct. 7, 2008

    Accepted: --

    Published Online: Feb. 1, 2010

    The Author Email: Tianya Tan (tantianya@126.com)

    DOI:10.3788/aos20103001.0272

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology