NUCLEAR TECHNIQUES, Volume. 47, Issue 5, 050004(2024)

Development of plasma light monitoring system for high-power radio frequency negative ion source

Yufan LI1, Puqiong YANG1、*, Jianglong WEI2, Bo LIU2, Xufeng PENG2, Yuwen YANG2, Yuqian LI1, and Yuanlai XIE2
Author Affiliations
  • 1School of Electrical Engineering, University of South China, Hengyang 421001, China
  • 2Institute of Plasma Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China
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    Figures & Tables(6)
    Structure diagram of plasma light monitoring system for negative ion source with multi RF driver
    On-site physical photos (a) Quarter of CRAFT NNBI test platform, (b) Expansion chamber
    #71900 RF discharge with single RF driver (top acquisition) (color online)
    Diagram of CRAFT 1/4 size negative ion source diagram and multi-channel measurement position
    (a) #72045 RF climbing discharge, (b) #72051 RF discharge with filtered magnetic field of 900 A, (c) #72053 RF discharge with filtered magnetic field of 700~1 850 A (color online)
    • Table 1. Photodiode and magnification calibration

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      Table 1. Photodiode and magnification calibration

      序列号

      SN

      650 nm零偏置模式

      650 nm zero bias mode Re/ mA∙mW-1

      固定电阻

      R / kΩ

      #10.43100
      #20.42100.1
      #30.4399.8
      #40.42100.2
      #50.4399.8
      #60.42100.1
      #70.4299.9
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    Yufan LI, Puqiong YANG, Jianglong WEI, Bo LIU, Xufeng PENG, Yuwen YANG, Yuqian LI, Yuanlai XIE. Development of plasma light monitoring system for high-power radio frequency negative ion source[J]. NUCLEAR TECHNIQUES, 2024, 47(5): 050004

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    Paper Information

    Category: Research Articles

    Received: Nov. 27, 2023

    Accepted: --

    Published Online: Jul. 8, 2024

    The Author Email: YANG Puqiong (阳璞琼)

    DOI:10.11889/j.0253-3219.2024.hjs.47.050004

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