[1] [1] Zhou Zhou, Zhou Jian, Sun Xiaowei et al.. Design of an irregularly shaped DBR for thin film solar cells ［J］. Acta Optica Sinica, 2011, 31(7): 0731002

[2] [2] Wang Yunfeng, Li Ming, Lin Wenxian et al.. Performance analysis on solar cell modules of flat-plate and trough concentrating photovoltaic system ［J］. Acta Optica Sinca, 2009, 29(8): 2287～2292

[3] [3] Yuan Genfu, Yao Yansheng, Chen Xuehui et al.. Experimental study on the quality of material surface applied laser-chemical combined etching ［J］. Chinese J. Lasers, 2010, 37(1): 281～283

[4] [4] X. S. Hua, Y. J. Zhang, H. W. Wang. The effect of texture unit shape on silicon surface on the absorption properties ［J］. Sol. Energy Mater. Sol. Cells, 2010, 94(2): 258～262

[5] [5] M. Spiegel, C. Gerhards, F. Huster et al.. Industrially attractive front contact formation methods for mechanically V-textured multicrystalline silicon solar cells ［J］. Sol. Energy Mater. Sol. Cells, 2002, 74(1-4): 175～182

[6] [6] L. Dobrzański, A. Drygala. Laser processing of multicrystalline silicon for texturization of solar cells ［J］. J. Materials Processing Technology, 2007, 191(1-3): 228～231

[7] [7] D. S. Ruby, S. Zaidi, S. Narayanan et al.. RIE-texturing of industrial multicrystalline silicon solar cells ［J］. J. Sol. Energy Eng., 2005, 127(1): 146～149

[8] [8] K. Lee, M. H. Ha, J. H. Kim et al.. Damage-free reactive ion etch for high-efficiency large-area multi-crystalline silicon solar cells ［J］. Sol. Energy Mater. Sol. Cells, 2011, 95(1): 66～68

[9] [9] K. Kim, S. K. Dhungel, S. Jung et al.. Texturing of large area multi-crystalline silicon wafers through different chemical approaches for solar cell fabrication ［J］. Sol. Energy Mater. Sol. Cells, 2008, 92(8): 960～968

[10] [10] W. Weinreich, J. Acker, I. Grber. The effect of H2SiF6 on the surface morphology of textured multi-crystalline silicon ［J］. Semicond. Sci. Technol., 2006, 21(9): 1278～1286

[11] [11] J. An, Y. Shi, Z. Liu et al.. The influence of NH4F on silicon etching in HF/HNO3/H2O system ［C］. Proceedings of ISES World Congress 2007, 2009, 4: 1051～1054

[12] [12] S. W. Park, J. Kim, L. S. Hone. Application of acid texturing to multi-crystalline silicon wafers ［J］. J. Korean Physical Society, 2003, 43(3): 423～426

[13] [13] P. Panek, M. Lipiński, J. Dutkiewicz. Texturization of multicrystalline silicon by wet chemical etching for silicon solar cells［J］. J. Mater. Sci., 2005, 40(6): 1459～1463

[14] [14] B. González-Díaz, R. Guerrero-Lemus, B. Díaz-Herrera et al.. Optimization of roughness, reflectance and photoluminescence for acid textured mc-Si solar cells etched at different HF/HNO3 concentrations ［J］. Materials Science and Engineering B, 2009, 159-160: 295～298

[15] [15] I. Zubel, M. Kramkowska. Development of etch hillocks on different Si (h k l) planes in silicon anisotropic etching ［J］. Surface Science, 2008, 602(9): 1712～1721

[16] [16] I. Zubel, M. Kramkowska. Etch rates and morphology of silicon (h k l) surfaces etched in KOH and KOH saturated with isopropanol solutions ［J］. Sensors and Actuators A, 2004, 115(2-3): 549～556

[17] [17] M. A. Gosálvez, K. Sato, A. S. Foster et al.. An atomistic introduction to anisotropic etching ［J］. J. Micromech. Microeng., 2007, 17(4): S1～S26

[18] [18] U. Gangopadhyay, S. K. Dhungel, K. Kim et al.. Novel low cost chemical texturing for very large area industrial multi-crystalline silicon solar cells ［J］. Semicond. Sci. Technol., 2005, 20(9): 938～946

[19] [19] A. Madhu, B. Tobias, O. Ingermar. Electrochemical texturing of multicrystalline silicon in alkaline solution ［C］. 24th European Photovoltaic Solar Energy Conference, 2009, 1779～1783

[20] [20] J. D. Hylton, A. R. Burgers, W. C. Sinke. Alkaline etching for reflectance reduction in multicrystalline silicon solar cells［J］. J. Electron. Soc., 2004, 151(6): G408～G427

[21] [21] Zhou Chunlan, Wang Wenjing, Zhao Lei et al.. Preparation and characterization of homogeneity and fine pyramids on the textured single silicon crystal ［J］. Acta Physica Sinica, 2010, 59(8): 5777～5783