Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Acta Optica Sinica, Volume. 32, Issue 12, 1211003(2012)

Study on the Off-Axis Illumination for Extreme Ultraviolet Lithography

Wang Jun1,2、*, Jin Chunshui1, Wang Liping1, and Lu Zengxiong1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (22)
    Cited By (6)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 6 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Wang Jun, Jin Chunshui, Wang Liping, Lu Zengxiong. Study on the Off-Axis Illumination for Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(12): 1211003

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Imaging Systems

    Received: Jun. 15, 2012

    Accepted: --

    Published Online: Oct. 25, 2012

    The Author Email: Jun Wang (wjciomp@gmail.com)

    DOI:10.3788/aos201232.1211003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology